Abstract
Based on previous results of the Er-doped GeO2 nanofilms fabricated by atomic layer deposition (ALD), the interfacial reactions of Al2O3 precursor within the GeO2/Al2O3:Er nanolaminates are investigated. The ALD pulse of Al(CH3)3 etches the as-deposited GeO2 nanofilm, while the oxidation of Al(CH3)3 by ozone realizes the deposition of atomic Al2O3 layer onto GeO2 surface. The Al2O3 atomic layers with ≥4 ALD cycles improve the thermal stability of the ALD GeO2 nanofilms, which restrain the formation of nanograins and also the reduction of film thickness during high-temperature annealing, giving rise to smooth GeO2/Al2O3:Er nanolaminates. For the 1530 nm electroluminescence (EL) from the silicon-based devices fabricated using the GeO2/Al2O3:Er nanolaminates annealed at 800 °C, the excitation efficiency is tripled to 22.1 %. The conduction of the energetic electrons resulting in the EL emissions still confirms to the trap-assisted tunneling mechanism within these amorphous GeO2/Al2O3:Er nanolaminates. The prototype devices based on the Al2O3-inserted nanolaminates exhibit comparatively increased operation time. These GeO2/Al2O3:Er nanolaminates with enhanced stability and improved optoelectronics performance pave the way for the practical utilization of ALD GeO2 nanofilms.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.