Abstract
A recently developed UHV investigation cell is used to study the optical properties of thin silver films by spectroscopic ellipsometry in the wavelength range 440–800 nm. The films were deposited on clean Si(111) substrates at ambient temperature, they exhibited a single-crystal structure with a marked (111) orientation and smooth surfaces. The optical results can be described by a two-layer model if planar surface plasmons are taken into account. By annealing up to 350 °C the films crack, and silver clusters are formed on the silicon surface. The film as well as the cluster structure is independently characterized by SEM, LEED/Auger, X-ray diffraction, and resistivity measurements.
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