Abstract
In this study, we investigated the effect of repetitive mechanical stress on the electrical characteristics of amorphous indium–tin–gallium–zinc oxide (a-ITGZO) thin-film transistors (TFTs). The degradation of the electrical characteristics of an a-ITGZO TFT with a curvature radius of 2 mm is minimal even after the TFT undergoes bending 105 times. Our technology computer-aided design simulation reveals that the electrical characteristics degraded by the repeated bending cycles are due to the increase in the acceptor-like Gaussian states (N GA) related with the generation of oxygen interstitial defects.
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