Effect of variation in glancing angle deposition on resistive switching property of WO3 thin films for RRAM devices

Abstract

In this paper, nanostructured tungsten oxide (WO3) thin films are deposited using the RF-magnetron sputtering technique in Glancing Angle (GLAD) arrangement. Variation in the structural, morphological, optical, and resistive switching (RS) characteristics of nanostructured WO3 film is investigated as a function of GLAD angle (60°–80°). Electrical studies on nanostructured WO3 films deposited at room temperature are found to exhibit enhanced bipolar resistive-switching properties in metal–insulator–metal pattern [Au/WO3/ITO]. The RON/ROFF ratio between high and low resistance states was noted to be about 190 besides a minimum set voltage of ∼2.22 V in the case of the WO3 thin film deposited at the 70° glancing angle. A detailed current transport mechanism analysis indicates the existence of ohmic-behavior and trap-assisted space charge limited conduction as the governing mechanisms at the state of low and high applied bias, respectively. Good data-retention characteristics coupled with reproducible and fast RS capabilities obtained with Au/WO3/ITO device structure promise scope of rapid development in future RS-based novel memory device applications.