Abstract
In this paper, the radio frequency (RF) magnetron sputtering (MS) method was utilized to fabricate multiple sets of the iron film samples under different sputtering powers. With the help of X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM) and vibrating sample magnetometer (VSM), how the sputtering power affected the structure, morphology and magnetic properties of the iron film was studied. XRD results showed that all Fe films have a polycrystalline bcc structure and (110) preferred orientation. According to the Bragg equation calculation, the larger the sputtering power, the larger the average grain size, which is consistent with the results of AFM particle size analysis. The main reason is that the sputtering power affects the grain growth mode. As the sputtering power increases, it gradually changes from a small island-like growth to a thick columnar growth. However, from the surface morphology and height profile, we saw that the iron film deposited under 230 W had the most uniform grain size distribution and the grain size was relatively small. This is why thin films deposited under this condition have the best soft magnetic properties. The saturation magnetization (Ms) reaches 1566 emu/cm3, coercivity (Hc) is 112 Oe, and squareness ratio (Mr/Ms) is 0.40. Therefore, iron film prepared under 230 W has good comprehensive properties (highest Ms, lower Hc and Mr/Ms) that provide an experimental basis for further thin film research work.
Highlights
Iron-based thin films are interesting because of their high saturation magnetization (Ms) and low coercivity (Hc) [1], which can be achieved by appropriate preparation processes
This is mainly due to the fact that the change of the sputtering power affected the Fe film’s growth mode, as explained in the cross-sectional morphology of the films
By comparing the cross-sectional morphology of the Fe films prepared under different sputtering powers, we found that the Fe films with a sputtering power of 360 W exhibited a columnar sputtered at 160 W and 230 W showed a fine fibrous structure; the Fe film at 283 W was in the transition phase of a columnar structure
Summary
Iron-based thin films are interesting because of their high saturation magnetization (Ms) and low coercivity (Hc) [1], which can be achieved by appropriate preparation processes. It has huge application prospects in many fields, such as magnetic recording, magnetic storage, magnetoresistive sensing, electromagnetic switches, magnetic shielding, spin semiconductors and other electronic devices [2,3,4,5]. The application of a high magnetic field during film growth can affect the grain size, regulate the growth direction of the columnar crystal, prevent grain overlap and the bending of columns, increase the saturation magnetization [2,6,7], and achieve vertical anisotropy [8].
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