Influence of surface roughness on magnetic property of magnetron sputter deposited FePtCo films

Abstract

ABSTRACT Thin films of FePtCo ternary alloy with 100 nm thickness have been deposited on an Si substrate using a DC magnetron sputtering system by co-sputtering of Co metal target and Fe40Pt60 alloy target in three different conditions, i.e. as-deposited at room temperature, annealed at 400 °C ∘ C , and deposited on the seed- layer. The effects of target sputtering power, leading to different compositions and various deposition conditions on surface roughness of films and magnetic properties, were studied. The average surface roughness of the as-deposited films decreases with the increase in the sputtering power of the Co target. For the annealed and seed-layered films, an increase in Co sputtering power resulted in an increased in roughness. Moreover, the annealed films possess smallerlower roughness due to an increase in the surface mobility. On the other hand, the Cu seed- layer decreases the roughness by preventing the diffusion of the film into the substrate. The room -temperature M-H measurement shows that the films exhibit soft ferromagnetism with coercivity in the order of 10 3 A/m and large saturation magnetizationmagnetisation of the order 10 6 A/m. The saturation magnetizationmagnetisation decreases with the increase in the sputtering power and is not influenced by the film surface roughness. On the other hand, riseincrease in surface roughness leads to decrease in coercivity of the films.