Abstract
The microstructure and the magnetic properties of polycrystalline Fe films were investigated in detail by controlling the condition of the ion-beam sputtering with an Ar-assisted process. Fe films were deposited at a sputtering-beam voltage, V s, in the range of 300–1800 V. The soft magnetic properties of the Fe films significantly improved with increasing V s, when the saturation magnetization, 4 πM s, and the coercivity, H c, were 16–21.5 kG and 5 Oe, respectively. This improvement was caused by the decrease of the crystallite size. In order to control the Fe crystallite size, Fe films were deposited when the Ar-assisted beam voltage, V A, was in the range of 80–2000 V, with the condition that the Ar to Fe arrival ratios were 1:1 ( R A = 1) and 1:0.1 ( R A = 0.1). Fe films with excellent soft magnetic properties, such as 4 πM s of about 21.5 kG and H c of 2.5 Oe, were deposited on the substrate and bombarded by a V A of 200 V at R A = 1 and a V A of 400 V at R A = 0.1. The result implies that bombardment by Ar ions, with the proper energy and flux, assists the improvement of the soft magnetic properties.
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