Abstract
NiCr films, thick, were prepared on substrates at room temperature as a function of chromium concentration by the cosputtering technique. The crystalline nature and electrical properties of the NiCr films were investigated as a function of chromium concentration. The films with a chromium concentration up to 39% showed a crystalline structure having a low resistivity, a high root-mean-square (rms) roughness, and positive temperature coefficient of resistivity (TCR) values. The films with a chromium concentration above 39% exhibited the amorphous structure with negative TCR values. The TCR values of the films with a chromium concentration of 39 and 42% are approximately and , respectively. The TCR values approaching zero can be established by controlling the chromium concentration in the NiCr films.
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