Effect of acid diffusion on performance in positive deep ultraviolet resists

Abstract

Two methods to measure acid diffusion in positive acid catalyzed resists are described. The first method employs a spectrophotometric titration to determine the acid concentration ([H+]) followed by measuring the ion conductivity (σ) of the resist film to determine the diffusion coefficient (D). This method allows the diffusion coefficient of acid in the resist to be determined at different temperatures ranging from room temperature to different post-exposure bake (PEB) temperatures. The second method is based on the threshold acid density theory of image formation, which assumes that when a critical concentration of acid is reached, the developer solubility of the resist is changed. With this method, a constant level of acid can be followed at different PEB times and the diffusion coefficient determined. A comparison of the two methods to measure the acid diffusion coefficient will be made and the temperature dependence of diffusion for different types of organic acids will be presented. Based on a previously described reaction–diffusion model that predicts relative deblocking levels, evidence is presented for room temperature diffusion of acid to be a possible explanation for delay instability in positive deep ultraviolet resists.