Abstract
AbstractMagnetic multilayers consisting of magnetic FeNi and non‐magnetic Ti layers were prepared by rf‐sputtering. Magnetic measurements and magnetic domain structure observations were used for characterization of the samples. The magnetoimpedance performance of FeNi/Ti‐based multilayers is evaluated in terms of the magnitude of the effect and its sensitivity with respect to applied magnetic field. The results show that the trilayer with Ti layer of 6 nm (sample A), deposited to avoid the possibility of appearance of a trascritical state, performs better than the sample with a 10 nm Ti layer (sample B). The best results are obtained with [FeNi/Ti]5/FeNi multilayered structure (sample C) reaching a value of about 60% of variation of the impedance at 180 MHz and a sensitivity of about 22%/Oe at 180 MHz.
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