Abstract
In this work patterning method of organic-inorganic hybrid methyl ammonium lead iodide (CH3NH3PbI3) perovskite films is demonstrated. It was estimated that using focused E-beam make possible to etch the perovskite film. Etching took place due to formation of lead-organic volatile compounds. The etching process was strongly depended on grazing angle of incident beam. It was estimated that etching effectively take place when grazing angle was close to 45 °C. Next key factor was an accelerating voltage. Structure changes take place when E-beam accelerating voltage exceeds 1 kV.Change of structure was tracked by X-ray diffractometry and X-ray photoelectron spectroscopy analyses. The surface evaluation was monitored by atomic force microscopy and scanning electron microscopy methods. Bulk composition was estimated by energy dispersive spectrometer.
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