Correlation between electron and negative O− ion emission during reactive sputtering of oxides

Abstract

The energy distribution of negative O− ions has been measured during the reactive magnetron sputtering of 13 different target materials by the means of energy resolved mass spectrometry. For the same series of target materials the ion-induced secondary electron emission coefficient was determined in an earlier published research. A correlation between this ion-induced secondary electron emission coefficient and the emission of the high energetic negative O− ions was observed. This correlation should be taken into consideration in the selection of oxides for their high electron emission coefficients as these materials will emit at the same time negative O− ions.