Abstract
The diffusion barrier properties of PVD Ru and PECVD / PEALD Ru-C films, deposited by RuEtcp 2 precursor and N 2/H 2 plasma, were compared on the basis of bias temperature stress measurements. An MIS test structure was used to distinguish between thermal diffusion induced by annealing and a Cu field drift due to applied electric fields. BTS-CV, TZDB and TDDB measurements revealed that the barrier performance is significantly better for PEALD and PECVD Ru-C films. This improvement is associated with carbon impurities in the Ru films with a concentration in the order of several percent according to ToF-SIMS and ERDA. The TDDB mean time to failure at 250 °C, +5 MV/cm was 7 s for PVD Ru samples, ≈500 s for PECVD Ru-C, ≈800 s for PEALD Ru-C and >3600 s for PVD TaN. Triangular voltage sweep measurements at 300 °C, 0.1 V/s confirmed the presence of Cu ions inside the SiO 2 for degraded dots, in contrast to the Al reference sample and to PVD TaN, which performed best among all the Cu barriers under test. XRD data suggests that PEALD and PECVD Ru-C films are only weakly crystalline.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.