Abstract
AbstractMetal-Insulator-Semiconductor (MIS) planar capacitors were fabricated in order to systematically investigate the effect of Cu and water in Cu/low-k structures by Triangular Voltage Sweep (TVS) measurements. We were able to resolve peculiar features in the TVS traces of Cu and water contaminated samples, which were related to Cu ions and protons, respectively. We demonstrate that these features can be used to distinguish the two ionic species. As these features do not depend on the specific dielectric, we provide a methodology to detect and distinguish Cu and water in porous low-k materials embedded in MIS structures.
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