Abstract
Nano-imprint lithography (NIL) is a simple, low cost and high-resolution patterning method. However the precise evaluation method of nano-imprinted structure has not been established. Synchrotron radiation small angle X-ray scattering (SR-SAXS) measurement is a nondestructive and high resolution characterization method. In this study, we attempt to fabricate nanostructures on the poly(lactic acid) (PLA) film by NIL and evaluated with microscopic and scattering techniques. The mold with line/space pattern was used for NIL. Scanning electron microscope observation confirmed the formation of surface nano-structure in large areas. Also, nano-imprinted PLA film was evaluated using SR-SAXS measurement. The scattering patterns obtained from nano-imprinted PLA films were clearly observed up to higher order scattering spots. These results suggested that highly regular structure was fabricated on the surface of PLA films.
Published Version
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