Abstract
This study examined the electrical and plasma properties of an internal linear inductive antenna for flat panel display processing. An internal linear antenna, which is referred to as a “double comb-type antenna”, with a substrate area of 2,300×2,000 mm2 was used as a large-area inductively coupled plasma (ICP) source. This extremely large area ICP source showed a transition from E-mode to H-mode near 3 kW. At 9 kW, a power transfer efficiency of approximately 81% was obtained. The plasma uniformity measured by a Langmuir probe was approximately 14% over the substrate area at 15 mTorr Ar and 5 kW of RF power.
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