Abstract
An internal-type linear inductive antenna, which is referred to as “double comb-type antenna”, was used as a large-area inductively coupled plasma (ICP) source with a substrate area of 2,300 mm × 2,000 mm. The characteristics of the ICP source were investigated for potential applications to flat panel display (FPD) processing. The source showed higher power transfer efficiency at higher RF power and higher operating pressures. The power transfer efficiency was approximately 88.1% at 9 kW of RF power and a pressure of 20 mTorr Ar. This source showed increasing plasma density and improved plasma uniformity with increasing RF power at a given operating pressure. A plasma density >1.5 × 1011/cm3 and a plasma uniformity of approximately 11% was obtained at 9 kW of RF power and 15 mTor Ar using this internal ICP source, which is applicable to FPD processing.
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