Abstract
The variation in plasma uniformity over an extremely large size inductively coupled plasma (ICP) source of 2750×2350mm2 was examined. An internal linear-type antenna called “double comb-type antenna” was used as the ICP source. A plasma density of ∼1.4×1011∕cm3 could be obtained at 5mTorr Ar by applying 10kW rf power to the source at a frequency of 13.56MHz. An increase in rf power from 1to10kW improved the plasma uniformity over a substrate area of 2300×2000mm2 from 18.1% to 11.4%. The improvement in uniformity of the internal ICP source was attributed to the increase in plasma density near the wall.
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