Characteristics of a rotational windmill-shaped radio frequency magnetron sputtering plasma for effective target utilization

Abstract

A rotational windmill-shaped radio frequency magnetron plasma source has been developed for improving the target utilization rate. Two kinds of magnet arrangements are designed by taking into account the E × B drift motion of electrons using simulated magnetic field profiles, where the electric field, E, is vertical to the target and the magnetic field, B, is parallel to the target, respectively. It is found that the Hall parameters of the electrons in the magnetron area have a higher value ranging from 12 to 110 for both magnet arrangements. This is high enough to magnetize electrons, while the electron Larmor radius is as low as 0.3–2.8 mm. The target utilization rate has attained approximately 65 % and 70 % for an initial and for an improved magnet arrangements, respectively. The improved magnet arrangement has a uniform profile of the target erosion compared with the initial magnet arrangement.