Chapter 5 - Manipulation and Patterning of Surfaces (Nanolithography)

Abstract

Lithography refers to the process invented in 1796 by Alloys Senefelder, where patterns of desired designs were transferred on to a base substrate, mostly using masks. The microelectronics industry is quite advanced in mass manufacturing of miniaturized devices, such as integrated circuits or nano electro mechanical systems. For this goal, the industry always seeks to develop advanced lithography procedures. The chapter begins with optical lithography and its variations, including immersion, multiple patterning lithography, the bread and butter procedure. Then in the new generation of lithography, which utilizes X-ray, extreme UV, and charge particles, both electron and ion beam lithography are covered. The chapter then covers the area of nanolithography using proximal probe nanolithography, including STM- and AFM-based nanolithography, as well as deposition and control of nanoparticles and atoms/molecules. A variety of other lithography procedures, such as nanoimprint (mold) lithography, plasmonic-assisted lithography, laser interference lithography, nanosphere lithography, chemistry-based nanofabrication, local electro etching, dip pen lithograph with AFM are discussed. The chapter also discusses resists and wear and tear and contamination of tips.