Abstract
The authors have developed a technique that couples nanolithographic patterning using an atomic force microscope with the parallel patterning abilities of soft lithography. Master pattern generation is accomplished using local anodic oxidation as a mask pattern for anisotropic wet etching of Si(110). The resulting nanostructures are then used as master patterns for the molding of polymeric stamps to be used for microcontact printing of alkanethiols. Analysis of the resulting patterns demonstrates the validity of this method as a simple, effective, and low cost alternative to conduct and prototype nanoscale patterning in a parallel fashion.
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