Anisotropic Wet Etching of Si as a Fabrication Tool Enabling 3-D Microphotonics Structures and Devices

Grant W Bidney,Vasily N Astratov,Augustine M Urbas,Kenneth W Allen,Thomas C Hutchens,Nicholaos I Limberopoulos,Lou Deguzman,Boya Jin,Joshua M Duran,Gamini Ariyawansa,Igor Anisimov,Sarath D Gunapala

doi:10.1109/naecon49338.2021.9696393

Anisotropic Wet Etching of Si as a Fabrication Tool Enabling 3-D Microphotonics Structures and Devices

Grant W Bidney, Vasily N Astratov + Show 10 more

https://doi.org/10.1109/naecon49338.2021.9696393

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Publication Date: Aug 16, 2021

Citations: 1

Affiliation: University of North Carolina at Charlotte, Air Force Research Laboratory Materials and Manufacturing Directorate, Georgia Institute of Technology, Air Force Research Laboratory Sensors Directorate, Jet Propulsion Laboratory

#Anisotropic Wet Etching Of Si #Anisotropic Etching Of Si + Show 8 more

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Abstract

It is shown that due to high speed and large volume of production, anisotropic wet etching of Si is a unique method of manufacturing high quality micropyramidal arrays for silicon photonics. Four types of arrays were fabricated: (i) square pyramids with the 54.7º slope of the sidewall surface, (ii) microcones with the 45º slope of sidewall surface, (iii) inverted square pyramids with 54.7º slope, and (iv) inverted triangular pyramids with different angles of the sidewalls. It is shown that the first type of arrays has a capability to produce tightly focused mid-wave infrared (MWIR) beams at the tips of the pyramids. Other arrays can be also used as light concentrators and various multifunctional microphotonic components.

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