Abstract
We propose to use two-dimensional metal hole-array (TMH) and spatial light modulator (SLM) technology to construct a parallel direct-writing system. SLM and movable platform are used to control the system for realizing multi-beam parallel scanning exposure to fabricate arbitrary patterns. In this system TMH is the key component which focuses the incident light beams into light spots in the photoresist by exciting local surface plasmon polariton (LSPP). Parameters of TMH are optimized to improve the focusing efficiency and transmission depth of the light spots. Theoretical analysis and numerical simulations show that the feature size and transmission depth can reach sub-80nm and 90nm, respectively, by an optimized TMH, which is feasible for parallel direct writing lithography.
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