Abstract

This paper presents an integrated germanium (Ge)-based THz impulse radiator with an optical waveguide coupled photoconductive switch in a low-cost silicon-on-insulator (SOI) process. This process provides a Ge thin film, which is used as photoconductive material. To generate short THz impulses, N++ implant is added to the Ge thin film to reduce its photo-carrier lifetime to sub-picosecond for faster transient response. A bow-tie antenna is designed and connected to the photoconductive switch for radiation. To improve radiation efficiency, a silicon lens is attached to the substrate-side of the chip. This design features an optical-waveguide-enabled “horizontal” coupling mechanism between the optical excitation signal and the photoconductive switch. The THz emitter prototype works with 1550 nm femtosecond lasers. The radiated THz impulses achieve a full-width at half maximum (FWHM) of 1.14 ps and a bandwidth of 1.5 THz. The average radiated power is 0.337 W. Compared with conventional THz photoconductive antennas (PCAs), this design exhibits several advantages: First, it uses silicon-based technology, which reduces the fabrication cost; second, the excitation wavelength is 1550 nm, at which various low-cost laser sources operate; and third, in this design, the monolithic excitation mechanism between the excitation laser and the photoconductive switch enables on-chip programmable control of excitation signals for THz beam-steering.

Highlights

  • Sandwiched between traditional microwave and optical spectrums, terahertz (THz) technology has attained great scientific interest in recent decades

  • Compared to a THz continous-wave (CW) signal, THz impulses feature ultra-wide bandwidth, usually larger than 1 THz. This wide frequency band allows THz impulse to be used for various applications, such as, biology and medicine sciences [1], environmental monitoring [2,3], chemical sensing [4,5], high-resolution three-dimensional imaging [6,7,8,9], nondestructive evaluation [10], and high-speed wireless communication link [11]

  • We present a Germanium (Ge)-based THz impulse radiator in silicon that resolves the aforementioned limitations

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Summary

Introduction

Sandwiched between traditional microwave and optical spectrums, terahertz (THz) technology has attained great scientific interest in recent decades. Researchers have been investigating various technologies that can produce high power and wideband THz impulses. Silicon-based fully-electronics THz impulse radiators have been reported using CMOS or BiCMOS process technologies [12,13,14,15,16]. These fully-electronics devices produce picosecond impulses that cover the lower end of THz spectrum (less than 1.1 THz). These designs feature the benefits of low cost, high scalability, and low power consumption

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