Abstract

This paper presents a model for the local atomic structure at the positively charged Qss defect at the Si/SiO2 interface. The defect center is shown to consist of a threefold-coordinated oxygen atom, bonded to three neighboring silicon atoms in a pyramidal configuration. The net positive charge of this center is distributed over this entire group of atoms.

Full Text
Published version (Free)

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call