Abstract
In this paper for the first time, we have studied various structures of nanosheet field-effect transistors (NSFET) and the effect of various devices and process parameters such as nanosheet width, length, interspacing, S/D doping, channel doping, random dopant fluctuations studied on these device structures. Comparative analysis has been done between JL-NSFET, GS-JL-NSFET, JL-SiGeNSFET and JL-GS-SiGeNSFET in terms of analog parameters. Nanosheet-based FETs are likely to be the successor of FinFET beyond the 5-nm node. NSFETs have better control over gate, variable sheet width and more current per device footprint which gives them the advantage of circuit design versatility. NSFET offers better gate control, better current and switching per device footprint. NSFETs are preferred over NWFETs due to better electrostatics, greater channel widths, decreased SCEs and increased device reliability.
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