Хлорид-гидридная газофазная эпитаксия полуполярного слоя AlN(1012) на наноструктурированной подложке Si(100)

Abstract

A new approach is proposed to the synthesis of a semipolar AlN on a Si(100) substrate at the surface for which the angle between the inclined plane of the nanogrooves and Si(100) is 47°. It is shown that the hydride vapor-phase epitaxy on a such nano-patterned substrate enables formation of a semipolar layer AlN (1012) characterized by the full width at half maximum value as low as ωθ ~60 arcmin for the x-ray diffraction rocking curve. It is found that the Raman spectra of the semipolar AlN(10-12) layer contain additional peaks on the Raman curves associated with phonons A1(TO) and E1(TO), in contrast to the polar AlN(0001) layer, where the peak A1(LO) is additionally manifested.