It is well known that by analysing the C-K-emission from low pressure grown diamond films that it is possible to extract information of the types of bonding present. A HFCVD reactor has been constructed which together with a small soft X-ray emission spectrometer is suitable for deposition studies in situ. First results are presented using a high energy electron beam as excitation source taking data when the deposition reaction is switched off. Data on the early carbon layer formed on Ni in a diamond deposition system is presented. The results show that the experimental system can be useful for studying different properties of the growth.