A significant challenge to the practical application of hybrid perovskites remains for photovoltaic application. Specifically, the presence of hygroscopic ionic small molecules – alkylammonium cations – has been identified as a primary source of the absorber's sensitivity towards any moisture and any temperatures greater than 150 °C. CH3NH3PbI3 , for instance, rapidly degrades upon exposure to modest relative humidity even at room temperature via: CH3NH3PbI3(s) → PbI2(s) + CH3NH3I(aq) A related, but distinct, decomposition pathway is induced by heating above 150 °C even under an inert and dry environment, where methylamine and hydroiodic acid have measurable vapor pressure: CH3NH3PbI3(s) → PbI2(s) + CH3NH2↑ + HI↑ Various attempts have been made to improve system stability including modification of chemistry, two dimensional (2D) hybrid perovskites, and macroscopic encapsulation. While these measures may slow degradation the effect is often modest, transient, and adds significant device complexity. Synthetically-compatible, pinhole-free functional overlayers, in contrast, would provide a simple route to surface chemical passivation as well as a physical barrier to diffusion in or out of the active layer. Atomic Layer Deposition (ALD) is a vapor-phase deposition technique with the capability to produce ultra-thin and pinhole-free films with well-defined surface chemical control and precise physical thickness, providing a good match to these challenges. However, the vast majority of oxide ALD processes invoke water (H2O), hydrogen peroxide (H2O2) or ozone (O3) as oxygen sources, often at temperatures greater than 150 °C. Unfortunately, these chemicals and temperatures are predicted to be in direct conflict with most hybrid perovskite halides and therefore may preclude an integrated overlayer approach. However, we report low temperature non-hydrolytic (i.e. waterless) ALD to establish stabilizing overlayers of Al2O3 or TiO2 directly on CH3NH3PbI3−xClx films. We demonstrate not only that oxide ALD conditions exist that are compatible with hybrid perovskite halides, but that the resulting systems exhibit dramatically improved stability against moisture (85% RH) and enhanced resistance to considerably higher temperatures (up to 250 °C) and even liquid water. We further demonstrate the capability of nh-TiO2 to serve a dual role – stabilizing the absorber underlayer and accepting electrons in future inverted photovoltaics.The figure shows the effect of a liquid water drop after two minutes directly on a perovskite halide thin film, without and with an ultrathin hybrid ALD passivation layer. Figure 1
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