The paper presents the analysis of Quantum-well Heterojunction Emitted Bipolar Transistor Design based on physical parameters with numerical computations. The specific objective of this work is to enhance the physical performance of the Quantum-well Heterojunction Emitted Bipolar Transistor Design in real world applications. There have been considered on the III-V compound materials like GaAs for p-type layer, AlGaAs for n-type layer and InGaAs for quantum-well layer for different kinds of junctions which were developed in HEBT structure. In this analyses, the parameters for implemented HEBT structure were evaluated to find the multi-quantum-well band diagram, operating frequency (unity beta frequency), rise time, storage delay time, fall time, minority carrier distribution, current gain variation, voltage-current characteristics and phonon control on quantum-well device. In these analyses, the physical parameters were carried out based on the experimental studies from the recent research works and many literatures. The physical parameters which used in this HEBT structure have been provided to solve the real fabrication problems by using theoretical concepts. The quantum-well device based on III-V compound materials was performed by using numerical techniques with the help of MATLAB. The simulation results confirm that the developed HEBT structure was suitable for fabricating the real devices for high performance applications.
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