β-Ga2O3 Films Research Articles

First-principles investigations and MOCVD growth of Si-doped β-Ga2O3 thin films on sapphire substrates for enhancing Schottky barrier diode characteristics

In the realm of high-power electronics, the potential of gallium oxide (β-Ga2O3) as a front-runner material has garnered significant attention due to its wide bandgap and the capacity to withstand high critical electric fields. To push the boundaries of performance for β-Ga2O3 devices, a meticulous exploration into the effects of silicon (Si) doping on β-Ga2O3 films was carried out using the metalorganic chemical vapor deposition (MOCVD) technique with various tetraethoxysilane (TEOS) flow rates (0–30 sccm). The Si-doped β-Ga2O3 films were systematically studied and characterized using XRD, SEM, and XPS techniques. XRD patterns demonstrated the preservation of the β-Ga2O3 monoclinic structure in the Si-doped β-Ga2O3 films, without any evidence of secondary phases. In addition to this, first-principles calculations were performed to explore the incorporation of Si atoms in Ga2O3 supercells, which revealed the preference of Si atoms to occupy substitutional Ga tetrahedral sites within the Ga2O3 lattice. Through the utilization of Si-doped β-Ga2O3 films, a unique design of donut-shaped Schottky barrier diode (SBD) was successfully engineered. Remarkably, the Si-doped β-Ga2O3 SBD (employed with 20 sccm TEOS flow rate) exhibited the breakdown voltage (Vbr) of 497 V and Baliga's Figure of Merit (BFOM) value of 1.16 kW/cm2, which is five-order higher BFOM compared to undoped β-Ga2O3 SBD. This substantial improvement in BFOM underscores the significant potential of Si-doped β-Ga2O3 films for high-power electronics, opening avenues for enhanced device efficiency and capabilities.

β-Ga2O3 van der Waals p-n homojunction

The van der Waals (vdW) p-n junctions are crucial to develop multifunctional and high-performance electronic and optoelectronic devices. The asymmetric doping effect in wide-bandgap (WBG) semiconductors poses a fundamental obstacle for fabricating the vdW p-n homojunction and impedes the development of full WBG semiconductors-based bipolar devices. In this study, we demonstrate the β-Ga2O3 vdW p-n homojunctions with 2.0 nm-thick vdW gap, 2.6 eV built-in potential and 1.5 μm-wide depletion region, via combining quasi-two-dimensional n-type β-Ga2O3 nanosheets with p-type β-Ga2O3 films. Various tunneling transports including direct tunneling, Fowler-Nordheim tunneling, and exciton-assisted tunnelling are observed and explored in detail. The β-Ga2O3 vdW p-n homojunction diodes possess high forward current density (3.0 × 10−3 A/cm2), extremely-low reverse leakage current density (3.0 × 10−9 A/cm2), high rectification ratio (106 under dark and 107 under illumination), high photoresponsivity (13.4 A/W) and detectivity (9.38 × 1013 Jones) at 10 V bias under 250 nm illumination, and narrowband detection for the deep-ultraviolet solar-blind spectral region. This work lays the foundation for β-Ga2O3 homogeneous bipolar vdW devices and paves the way to advance the next-generation electronic and optoelectronic multifunctional devices based on the vdW integration.

Effects of growth temperature on phase transformation and crystal quality of Ga2O3 films grown on Si/AlN composite substrates by MOCVD

High-quality ε-phase Ga2O3 thin film with a FWHM of 0.68° for the (002) plane in omega scan is grown on Si/AlN composite substrate by MOCVD. The crystal phase evolution and microstructure of Ga2O3 thin films at different temperatures are studied systematically. It is found that Ga2O3 changes from amorphous at 400 °C to ε-phase at 500 °C. As the temperature further rises to 600 °C, it eventually transforms into β-phase. Due to the difference of lattice mismatch, ε-Ga2O3 is crystalline with high crystallinity on the surface of the film, but amorphous at the interface, while β-Ga2O3 is polycrystalline. In addition, ε-Ga2O3 thin films not only have the smoothest surface with roughness of 2.63 nm, but also the content of point defects (such as oxygen vacancies) is significantly reduced compared with that of amorphous and β-Ga2O3 thin films. This work provides important references for the hetero-integration of Si and Ga2O3 by MOCVD, and is beneficial for the development of low cost and high crystal quality Ga2O3 thin films which are suitable for high voltage and ultraviolet optoelectronics.

Microstructure and optical properties of β-Ga2O3 thin films fabricated by pulsed laser deposition

β-Ga2O3 has attracted extensive attention in the fields of optoelectronics and high-power electric devices due to its excellent electrical properties and thermal stability. Growth of epitaxial β-Ga2O3 films with good crystallinity is challenging since it is difficult to effectively control the impurities in the films. Here, β-Ga2O3 thin films were epitaxially grown on MgO (100) substrates via pulsed laser deposition system. The microstructure and optical properties of the β-Ga2O3 thin films were systematically characterized by combining high-resolution X-ray diffraction, X-ray photoelectron spectroscopy, ultraviolet–visible spectrophotometer and advanced transmission electron microscopy. Effects of the growth temperature and O2 partial pressure on the crystallinity, valance states of Ga ions and band gap of the β-Ga2O3 thin films were investigated. The light absorption wavelength of the β-Ga2O3 thin films ranges from 220 nm to 260 nm, which is close to the theoretical value. The epitaxial orientation between β-Ga2O3 film and MgO substrate is β-Ga2O3 (100) [02¯1] // MgO (100) [010]. A thin layer of γ-Ga2O3 exists in the interfacial region.

High-Performance Solar-Blind Photodetector Based on (010)-Plane β-Ga2O3 Thermally Oxidized from Nonpolar (110)-Plane GaN.

A high-performance planar structure metal-semiconductor-metal-type solar-blind photodetector (SBPD) was fabricated on the basis of (010)-plane β-Ga2O3 thermally oxidized from nonpolar (110)-plane GaN. A full width at half maximum of 0.486° was achieved for the X-ray rocking curve associated with (020)-plane β-Ga2O3, which is better than most reported results for the heteroepitaxially grown (-201)-plane β-Ga2O3. As a result of the relatively high crystalline quality, a dark current as low as 6.30 × 10-12 A was achieved at 5 V, while the photocurrent reached 1.86 × 10-5 A under 254 nm illumination at 600 μW/cm2. As a result, the photo-to-dark current ratio, specific detectivity, responsivity, and external quantum efficiency were calculated to be 2.95 × 106, 2.39 × 1012 Jones, 3.72 A/W, and 1815%, respectively. Moreover, the SBPD showed excellent repeatability and stability in the time-dependent photoresponse characteristics with fast relaxation time constants for the rise and decay processes of only 0.238 and 0.062 s, respectively. This study provides a promising approach to fabricate the device-level (010)-plane β-Ga2O3 film and a new way for the epitaxial growth of (010)-plane β-Ga2O3 and (110)-plane GaN as mutual substrates.

Highly Polarization-Deep-Ultraviolet-Sensitive β-Ga2O3 Epitaxial Films by Disrupting Rotational Symmetry and Encrypted Solar-Blind Optical Communication Application.

Ultrawide bandgap semiconductor β-Ga2O3 (4.9 eV), with its monoclinic crystal structure, exhibits distinct anisotropic characteristics both optically and electrically, making it an ideal material for solar-blind polarization photodetectors. In this work, β-Ga2O3 epitaxial films were deposited on sapphire substrates with different orientations, and the mechanisms underlying the anisotropy of these epitaxial films were investigated. Compared to c-plane sapphire, the lattice mismatch between m- or r-plane sapphire and β-Ga2O3 is more pronounced, disrupting the rotational symmetry of the films and rendering them anisotropic. Thanks to the improved anisotropy, the polarization ratio of the photodetector based on β-Ga2O3 films grown on r-plane substrates is 0.24, nearly ten times higher than that on c-plane substrates. Finally, by utilizing these polarization-sensitive photodetectors, we developed an encrypted solar-blind ultraviolet optical communication system. Our work provides a new approach to facilitate the fabrication and application of high-performance polarization-sensitive solar-blind photodetectors.

Influencing the morphological stability of MOVPE-grown β-Ga2O3 films by O2/Ga ratio

The morphology evolution of (100) β-Ga2O3 films grown by metalorganic vapor phase epitaxy (MOVPE) is studied by atomic force microscopy (AFM). In particular, when grown under a high O2/Ga ratio (O2/Ga = 1250) and above a thickness of 350 nm, these films exhibit striking morphological instabilities, including step meandering and bunching, which contribute significantly to surface roughening. Transmission electronic microscopy (TEM) measurements reveal a morphological transition on the growing surface with a coexistence of step-flow and step-bunching growth modes resulting from these instabilities. In contrast, growth conditions with low O2/Ga ratios (O2/Ga = 350) effectively suppress meandering and bunching instabilities, resulting in films with excellent electrical properties. These observations are rationalized through the Burton-Cabrera-Frank (BCF) theory and Bales-Zangwill (BZ) instability (Gibbs-Thompson effect and Mullins-Sekerka instability) , thus bridging theoretical models and the experimental results.

Investigation of Si incorporation in (010) β-Ga2O3 films grown by plasma-assisted MBE using diluted disilane as Si source and suboxide Ga2O precursor

Traditionally, elemental Ga and Si have been used to supply Ga and Si, respectively, in molecular beam epitaxy (MBE) to grow Si-doped β-Ga2O3. In this work, we investigated the feasibility of enhancing the β-Ga2O3 growth rate by using a Ga-suboxide precursor in a plasma-assisted MBE. Additionally, Si doping of β-Ga2O3 using diluted disilane and Ga-suboxide as the Si and Ga precursors, respectively, was studied. The growth rate and film quality under different suboxide fluxes were inspected. We found that Si concentration has an inverse relationship with Ga2O flux due to atom competition. A room-temperature mobility of 115 cm2/V s was measured for an electron concentration of 1.2 × 1017 cm−3 on the sample grown using a Ga2O beam equivalent pressure of 1.1 × 10−7 Torr and a disilane flow rate of 0.006 sccm. Temperature-dependent Hall characterization was performed on this sample, revealing compensating acceptor and neutral impurity densities of 2.70 × 1015 and 8.23 × 1017 cm−3, respectively.

Unraveling evolution of microstructural domains in the heteroepitaxy of β -Ga2O3 on sapphire

Addressing microstructural domain disorders within epitaxial β-Ga2O3 is critical for phase engineering and property improvement, whereas the associated evolution of β-Ga2O3 heteroepitaxial domains remains largely unexplored. In this Letter, we conducted a quantitative investigation of microstructural domains in (−201)-oriented epitaxial β-Ga2O3 films grown on (0001) sapphire using halide vapor-phase epitaxy technique with a β-(Al0.57Ga0.43)2O3 buffer layer. The distinct split of x-ray diffraction rocking curves for (−201) β-Ga2O3 grown below 950 °C was observed, indicative of domain tilt disorders. As quantitatively assessed by transmission electron microscopy, the domain tilt angle significantly decreases from 2.33° to 0.90° along the [132] zone axis and from 2.3° to 0.56° along the [010] zone axis, respectively, as the growth temperature is elevated from 850 to 1100 °C. The reduction in tilt disorders is accompanied by the decrease in in-plane domain twist. It indicates that the elimination of small-angle domain boundaries is energetically favorable at high growth temperature above 1000 °C. The quantitative investigation on the evolution of domain disorders in β-Ga2O3 shed light on the pathway to improve epitaxial quality for cutting-edge power electronic and optoelectronic device applications.

Understanding the effects of annealing induced structural transformations on the UVC absorbance and other optical properties of RF sputter deposited Ga2O3 thin films

Gallium oxide (Ga2O3) is a transparent material with high absorption in the UVC region of the electromagnetic spectrum and hence is a very important candidate in the field of short wavelength optical device fabrication. A proper understanding of the different optical parameters is necessary for developing more efficient coatings and devices. In this work, changes in the optical behavior of Ga2O3 thin films due to post-deposition annealing (at temperatures 300 °C–900 °C) are discussed in detail. Structural, surface morphological and compositional modifications of the films are identified using the x-ray diffractometer, scanning electron microscopy and x-ray photoelectron spectrometer techniques, respectively. At 900 °C, a highly stable monoclinic β phase of Ga2O3 is obtained. The optical transmittance spectra acquired using UV–Vis spectroscopy indicate an improved UVC absorbance of the β-Ga2O3 films with an excellent visible transmittance (>80%). The structural transformation from amorphous to crystalline β-Ga2O3 phase and the associated reduction in defect density is found to modify other optical attributes, like the bandgap energy, Urbach energy, dispersion parameters, etc.

Structural and surface characterizations of 2D β-In2Se3/3D β-Ga2O3 heterostructures grown on c-Sapphire substrates by molecular beam epitaxy

Integrating two-dimensional (2D) layered materials with wide bandgap β-Ga2O3 has unveiled impressive opportunities for exploring novel physics and device concepts. This study presents the epitaxial growth of 2D β-In2Se3/3D β-Ga2O3 heterostructures on c-Sapphire substrates by plasma-assisted molecular beam epitaxy. Firstly, we employed a temperature-dependent two-step growth process to deposit Ga2O3 and obtained a phase-pure (2¯01)\\documentclass[12pt]{minimal} \\usepackage{amsmath} \\usepackage{wasysym} \\usepackage{amsfonts} \\usepackage{amssymb} \\usepackage{amsbsy} \\usepackage{mathrsfs} \\usepackage{upgreek} \\setlength{\\oddsidemargin}{-69pt} \\begin{document}$$(\\overline{2 }01)$$\\end{document} β-Ga2O3 film on c-Sapphire. Interestingly, the in-situ reflective high-energy electron diffraction (RHEED) patterns observed from this heterostructure revealed the in-plane ‘b’ lattice constant of β-Ga2O3 ~ 3.038Å. In the next stage, for the first time, 2D In2Se3 layers were epitaxially realized on 3D β-Ga2O3 under varying substrate temperatures (Tsub) and Se/In flux ratios (RVI/III). The deposited layers exhibited (00l) oriented β-In2Se3 on (2¯01)\\documentclass[12pt]{minimal} \\usepackage{amsmath} \\usepackage{wasysym} \\usepackage{amsfonts} \\usepackage{amssymb} \\usepackage{amsbsy} \\usepackage{mathrsfs} \\usepackage{upgreek} \\setlength{\\oddsidemargin}{-69pt} \\begin{document}$$(\\overline{2 }01)$$\\end{document} β-Ga2O3/c-Sapphire with the epitaxial relationship of [112¯0]\\documentclass[12pt]{minimal} \\usepackage{amsmath} \\usepackage{wasysym} \\usepackage{amsfonts} \\usepackage{amssymb} \\usepackage{amsbsy} \\usepackage{mathrsfs} \\usepackage{upgreek} \\setlength{\\oddsidemargin}{-69pt} \\begin{document}$$[11\\overline{2 }0]$$\\end{document} β-In2Se3 || [010] β-Ga2O3 and [101¯0]\\documentclass[12pt]{minimal} \\usepackage{amsmath} \\usepackage{wasysym} \\usepackage{amsfonts} \\usepackage{amssymb} \\usepackage{amsbsy} \\usepackage{mathrsfs} \\usepackage{upgreek} \\setlength{\\oddsidemargin}{-69pt} \\begin{document}$$[10\\overline{1 }0]$$\\end{document} β-In2Se3 || [102] β-Ga2O3 as observed from the RHEED patterns. Also, the in-plane ‘a’ lattice constant of β-In2Se3 was determined to be ~ 4.027Å. The single-phase β-In2Se3 layers with improved structural and surface quality were achieved at a Tsub ~ 280 °C and RVI/III ~ 18. The microstructural and detailed elemental analysis further confirmed the epitaxy of 2D layered β-In2Se3 on 3D β-Ga2O3, a consequence of the quasi-van der Waals epitaxy. Furthermore, the β-Ga2O3 with an optical bandgap (Eg) of ~ 5.04 eV (deep ultraviolet) when integrated with 2D β-In2Se3, Eg ~ 1.43eV (near infra-red) can reveal potential applications in the optoelectronic field.

Unveiling structural and optical properties of Sn-doped β-Ga2O3: A correlation of experimental and theoretical observations

This work presents the experimental and theoretical insights into the structural and optical properties of tin (Sn)-doped β-Ga2O3. Sn-doped β-Ga2O3 films were fabricated using the low-pressure chemical vapor deposition (LPCVD) method onto the c-plane sapphire substrate. Further, deposited thin films were characterized for their structural and optical properties. XRD pattern depicts the crystalline nature of β-Ga2O3. The energy band gap (Eg) obtained from UV–Vis spectra has been decreased from 4.82 eV to 4.77 eV for as-deposited β-Ga2O3 to Sn-doped β-Ga2O3, respectively. However, an increase in absorbance has been observed in Sn-doped β-Ga2O3 films. Further, the first principle study based on density functional theory (DFT) has been used to comprehend the effect of Sn doping in β-Ga2O3 films. DFT result reveals the expansion of the lattice parameter of intrinsic β-Ga2O3 on the introduction of the Sn atom. Furthermore, a reduction in Eg has been observed upon Sn doping into the β-Ga2O3 structure similar to the experimental results. The reason behind the reduction in the Eg may be due to the Sn-5s energy level at the bottom of the conduction band as revealed in density of state (DOS) investigations. Also, the DOS results of Sn-doped β-Ga2O3 suggest that the atom has tended to form the ionic bond characteristics with the introduction of Sn into the β-Ga2O3, where the free electrons of the Sn-5s orbital state will fill the conduction band and may improve the conductivity. Additionally, optical properties such as reflectance and dielectric loss of function have been investigated. The reflectance and dielectric loss of function result proposed that more energy was absorbed when Sn was introduced to β-Ga2O3. Therefore, our observation suggests that upon Sn doping into β-Ga2O3, optical as well as structural properties were improved and these improved properties may be useful for optoelectronic devices.Novelty statementβ-Ga2O3 is an emerging material for optoelectronic device applications due to its excellent wide energy band gap, high critical electric field strength, high melting point, high Baliga figure of merits (BFOM), and exceptional physical and chemical stability. However, intrinsic β-Ga2O3 suffers from poor mobility and surface defects. Therefore, β-Ga2O3 needs a dopant material to enhance its' structural and optical properties. In this case, Sn doping may improve the optoelectronic properties of β-Ga2O3. Therefore, detailed theoretical and experimental investigations on Sn-doped β-Ga2O3 become necessary to understand inside phenomena. However, lots of experimental and theoretical works have been performed on Sn-doped β-Ga2O3. But, to date, there is no available report related to the correlation of theoretical and experimental data-based studies on Sn-doped β-Ga2O3. In this work, we have explored the structural and optical properties of Sn-doped β-Ga2O3 thin films deposited by the LPCVD method on the c-plane sapphire substrate. Further, the experimental results obtained were correlated with the first principal based DFT results. Our observation suggests that upon Sn doping into β-Ga2O3, optical as well as structural properties were improved and these improved properties may be useful for optoelectronic devices.

Enhancing the quality of homoepitaxial (−201) β-Ga2O3 thin film by MOCVD with in situ pulsed indium

This article innovatively uses pulsed metal-organic chemical vapor deposition technology to optimize the quality of β-Ga2O3 thin films on (−201) β-Ga2O3 homo-substrate using indium pulse-assisted technology. The results demonstrate that the pulsed indium-assisted method, when compared with the traditional indium-assisted method, effectively suppresses the desorption of Ga2O, enhances the flatness of the β-Ga2O3 film, and reduces the surface roughness from 34.8 to 0.98 nm. The optimized single crystalline β-Ga2O3 film was grown with pulsed-indium, and the full width at half maximum of x-ray diffraction rocking curve was 30.42 arc sec, smaller than that of the continuous indium β-Ga2O3 (56.1 arc sec). In combination with the x-ray photoelectron spectroscopy O1s split-peak fitting analysis, the relative content of oxygen vacancies in the film was significantly reduced by pulsed indium-assisted method. The Hall mobility of films assisted by pulsed-indium is approximately 14 times higher than that of films assisted by traditional indium. The pulsed indium technology provides an idea for homoepitaxial growth of high-quality β-Ga2O3 films.

Optical and optoelectronic properties of gallium oxide films fabricated by the chemical vapour deposition method

The present work investigated the influence of growth time on the structural, optical, and optoelectronic properties of β-Ga2O3 films produced on Si substrates by the chemical vapour deposition method. The prepared films were characterized by X-ray diffraction, field-emission scanning electron microscope, and UV–Vis spectrophotometer. The films exhibited a mixed phase (β-α)-Ga2O3 crystal structure. The crystallite size ranged between 34.98 and 164.69 nm. The bandgap increased from 4.74 to 4.88 eV. The absorption and extinction coefficients were in the orders of 103 and 10−1, respectively. The refractive index, dispersive energy and single oscillator energy increased from 1.86 to 1.87, 19.24 to 28.64, and 8.36 to 9.54, respectively, with an increase of growth time. The oscillator strength, oscillator wavelength, third-order nonlinear optical susceptibility and dispersion of refractive index were in the orders of 10−4, 10−2, 10−10 and 10−9, respectively. The carrier concentration, optical conductivity, optical mobility, and optical resistivity were also evaluated. The real and imaginary dielectric constants, and plasmon frequency were also determined.

Two-step growth of β-Ga2O3 on c-plane sapphire using MOCVD for solar-blind photodetector

In this work, a two-step metal organic chemical vapor deposition (MOCVD) method was applied for growing β-Ga2O3 film on c-plane sapphire. Optimized buffer layer growth temperature (T B) was found at 700 °C and the β-Ga2O3 film with full width at half maximum (FWHM) of 0.66° was achieved. A metal−semiconductor−metal (MSM) solar-blind photodetector (PD) was fabricated based on the β-Ga2O3 film. Ultrahigh responsivity of 1422 A/W @ 254 nm and photo-to-dark current ratio (PDCR) of 106 at 10 V bias were obtained. The detectivity of 2.5 × 1015 Jones proved that the photodetector has outstanding performance in detecting weak signals. Moreover, the photodetector exhibited superior wavelength selectivity with rejection ratio (R 250 nm/R 400 nm) of 105. These results indicate that the two-step method is a promising approach for preparation of high-quality β-Ga2O3 films for high-performance solar-blind photodetectors.

β-Ga2O3 Schottky Barrier Diode with Ion Beam Sputter-Deposited Semi-Insulating Layer

Vertical Schottky barrier diodes based on an ion beam sputter (IBS)-deposited β-Ga2O3 film on a single-crystalline (2¯01) unintentionally doped (UID) β-Ga2O3 with a Ni contact were developed. To form ohmic Ti/Ni contacts, the IBS-Ga2O3/UID β-Ga2O3 structures were wet-etched, and an indium tin oxide (ITO) intermediate semiconductor layer (ISL) was deposited on the opposite surface of the UID β-Ga2O3. The IBS-deposited Ga2O3 layer was polycrystalline and semi-insulating. Low leakage currents, rectification ratios of 3.9 × 108 arb. un. and 3.4 × 106 arb. un., ideality factors of 1.43 and 1.24, Schottky barrier heights of 1.80 eV and 1.67 eV as well as breakdown voltages of 134 V and 180 V were achieved for diodes without and with ITO-ISL, respectively. The surface area of the IBS-Ga2O3 film acted as a thin dielectric layer and, together with the preliminary wet etching, provided low leakage currents and relatively high Schottky barrier heights. Diodes with a Schottky barrier based on a Ni/IBS-deposited Ga2O3 film contact were demonstrated for the first time.

Revealing the influence of aerosol particle state on the high-quality α-Ga2O3 single crystal thin film growth by Mist CVD epitaxy

There is little research on α-Ga2O3 single crystal film because it is a metastable phase of Ga2O3 crystal and difficult for controllable fabrication. In this paper, highly crystallized Ga2O3 thin films of poly-crystalline, α-Ga2O3 and β-Ga2O3 were prepared by modulating the growth temperature from 400 °C to 700 °C by mist-assisted CVD (Mist CVD) method. The results show that films grown at 525 °C owes the best crystalline quality of α-Ga2O3 film. To further improve the crystallinity of α-Ga2O3 thin film, a systematic simulation revealing the distribution changes of aerosol particle size, flow field, and temperature gradient in the reaction chamber were explored. The optimal growth region C with uniform particle size, well-distribute temperature gradient and stable flow field is determined. Meanwhile, the experimental results of α-Ga2O3 thin films grown at different positions in the reaction chamber was proved to consistent with the simulation results. Furthermore, the optimal single crystallized α-Ga2O3 thin films with smooth surface morphology and optical property were obtained. The PL spectrum operated at room temperature show the α-Ga2O3 film with low defect density and high crystalline quality. It shows that the single crystallized α-Ga2O3 is orientated grown on sapphire substrate with epitaxial relationship of α-Ga2O3 (0006)//c-Al2O3 (0006). Although, slight lattice mismatch is observed on the selected area electron diffraction pattern of the interface between sapphire and α-Ga2O3 film, it is ideal for further application in devices. This work reveals the key point for α-Ga2O3 single crystal film growth by mist CVD is to construct a steady and orderly environment through controlling aerosol particle state.

Influence of particle size distribution on dielectric, electrical, and microstructural properties of aerosol-deposited Ga2O3 film for advanced electronic device

Gallium oxide (Ga2O3) films have been the subject of recent scientific and technological research, owing to their outstanding characteristics. In this study, a rapid and efficient aerosol deposition (AD) process was utilized to produce Ga2O3 films. The effect of the particle size distribution (PSD) of the columnar or plate-like Ga2O3 starting powder on the dielectric, electrical, and microstructural properties of the films was also investigated. The dielectric constant and loss tangent of polycrystalline β-Ga2O3 films fabricated using AD with narrow PSD Ga2O3 powder were 10 and 6.7% at 10 kHz, respectively. In contrast, the films composed of a wide PSD powder exhibited a dielectric constant of 18 and a loss tangent of 3.6%. The leakage current densities of 1.77 × 10−5 and 6.63 × 10−7 A/cm2 at 5 V of the films using narrow and wide PSD powder were observed, respectively. In addition, the breakdown electric fields of the Ga2O3 films with narrow and wide PSD powder were 1.15 and 1.06 MV/cm, respectively. Qualitative and quantitative analyses of the surface and inner microstructure were conducted to elucidate the differences in film characteristics according to the PSD. Consequently, a wider PSD enables the production of relatively denser and flatter high-quality films owing to enhanced hammering and crush effects. These results suggest potential applications of Ga2O3 films fabricated using AD in various fields, such as capacitors, power semiconductors, and sensor devices.

Surface chemical composition and HRTEM analysis of heteroepitaxial β-Ga2O3 films grown by MOCVD

β gallium oxide (β-Ga2O3) is an ultrawide bandgap semiconductor with great potential for solar-blind ultraviolet detection, power devices, and gas sensing. However, the understanding of the surface properties of β-Ga2O3 remains insufficient. Here, epitaxial growth of β-Ga2O3 films was carried by metal–organic chemical vapor deposition (MOCVD) on sapphire substrates. The surface chemical composition, surface layer crystalline properties, and surface morphology of the β-Ga2O3 films were discussed and analyzed in detail. By comparing the atomic ratios of O/Ga, the surface morphology, and the crystalline properties of the films, we attribute the component of O 1s with the binding energy around 531.8 eV to surface lattice O atoms. Moreover, the one-dimensional defects inside the surface layers and the near-interface regions of the films were observed at atomic scale by high resolution transmission electron microscopy (HRTEM). By comparing the lattice fringes of different facets, the geometric phase uniformity, and the distribution of strain, we found that the crystalline quality of the surface layers is much higher than the near-interface regions.

Silicon implantation and annealing in β-Ga2O3: Role of ambient, temperature, and time

Optimizing thermal anneals of Si-implanted β-Ga2O3 is critical for low resistance contacts and selective area doping. We report the impact of annealing ambient, temperature, and time on the activation of room temperature ion-implanted Si in β-Ga2O3 at concentrations from 5 × 1018 to 1 × 1020 cm−3, demonstrating full activation (>80% activation, mobilities >70 cm2/V s) with contact resistances below 0.29 Ω mm. Homoepitaxial β-Ga2O3 films, grown by plasma-assisted molecular beam epitaxy on Fe-doped (010) substrates, were implanted at multiple energies to yield 100 nm box profiles of 5 × 1018, 5 × 1019, and 1 × 1020 cm−3. Anneals were performed in an ultra-high vacuum-compatible quartz furnace at 1 bar with well-controlled gas compositions. To maintain β-Ga2O3 stability, pO2 must be greater than 10−9 bar. Anneals up to pO2 = 1 bar achieve full activation at 5 × 1018 cm−3, while 5 × 1019 cm−3 must be annealed with pO2 ≤ 10−4 bar, and 1 × 1020 cm−3 requires pO2 < 10−6 bar. Water vapor prevents activation and must be maintained below 10−8 bar. Activation is achieved for anneal temperatures as low as 850 °C with mobility increasing with anneal temperatures up to 1050 °C, though Si diffusion has been reported above 950 °C. At 950 °C, activation is maximized between 5 and 20 min with longer times resulting in decreased carrier activation (over-annealing). This over-annealing is significant for concentrations above 5 × 1019 cm−3 and occurs rapidly at 1 × 1020 cm−3. Rutherford backscattering spectrometry (channeling) suggests that damage recovery is seeded from remnant aligned β-Ga2O3 that remains after implantation; this conclusion is also supported by scanning transmission electron microscopy showing retention of the β-phase with inclusions that resemble the γ-phase.