For modeling the carbon tetrafluoride disposal required in the semiconductor fabrication process, this paper proposes a numerical approach to predict the decomposition characteristics of carbon tetrafluoride in a reaction chamber via a nontransferred, direct-current torch, where the magnetohydrodynamic equations, such as the continuity, momentum, energy, and current continuity equations together with turbulence transport equations, are solved with a parallelized finite-volume approach. The thermal plasma is assumed in local thermal equilibrium, and a kinetics model is adopted to consider the transport phenomena as well as the chemical reactions of various species arising in the decomposition process. The proposed model is validated for a rod-type torch operating at 100 SLPM, 80 A, and 18 kW, whereas carbon tetrafluoride of various concentrations well premixed with the nitrogen of 300 SLPM is injected into the hollow torch with the possible presence of water vapor. The major products stemming from the decomposition mechanism of carbon fluoride with water are H2O, OH, H, O, H2, O2, HO2, H2O2, O3, H+, O+, F, HF, CF, CO, CH, F2, CHF, CF2, COF, CO2, CH2F, CF3, COF2, CH2F2, CF4, CHF3, and electron, where 28 species and 75 chemical reactions are considered in the proposed model. The measured destruction and removal efficiency of carbon tetrafluoride slightly decreases with the increase of the incoming concentration of CF4. The numerical model delivers a quantitative and qualitative agreement with the experimental measurement. The discrepancy can be explained by the secondary decomposition of the process gas after exiting the reaction chamber and before leaving the detoxifying system.