Imprinted ionic synthesis through the sol-gel process for Ni (II) adsorption has been carried out. Sodium silicate from rice husk ash (NaSiO3(RHA)), N1-(3 Trimethoxysilylpropyl) diethylenetriamine (TMPDT) and Ni (II) are stirred, then 6 M HCl is added until a gel forms. Furthermore, 0.1 M EDTA and 0.1 M HNO3 were added to the dry gel to release Ni (II) to form-imprinted ionic material (SiO2-TMPDT-Ni-Imp). The material was characterized using FTIR, SAA, and SEM-EDX. FTIR characterization of SiO2-TMPDT-Ni-Imp indicated the appearance of-OH, -CH, -Si-O-and-NH absorption. The SAA characterization results show a surface area of 18.091 m2/g, a total pore volume of 0.033 cc/g, and an average pore radius of 16.739 Å. The optimum conditions for Ni (II) adsorption by SiO2-TMPDT-Ni-Imp are pH four and a contact time of 100 minutes. The appropriate adsorption kinetic model for the absorption of Ni (II is pseudo-second order with an adsorption capacity of 6.9 mg/g. Keywords: Silica, imprinted ionic, rice husk ash, adsorption, Ni (II)
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