Formation and Organization of Amino Terminated Self-assembled Layers on Si(001) Surface

E Pişkin,B Garipcan,M Duman,M O Çağlayan,G Demirel

doi:10.1007/s11671-007-9071-7

E Pişkin, B Garipcan + Show 3 more

Open Access

https://doi.org/10.1007/s11671-007-9071-7

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Journal: Nanoscale Research Letters	Publication Date: Jun 29, 2007
Citations: 28	License type: cc-by

Affiliation: Hacettepe University

Abstract

We have investigated the effects of dipping time, solution concentration and solvent type on the formation of self-assembled monolayers with aminosiloxane molecules (i.e.,N-(3 trimethoxysilylpropyl)diethylenetriamine (TPDA)) on the Si(001) surface. Studies performed with an ellipsometer showed that monolayers with a thickness of about 1.2 nm were formed when the dipping time is about 2 h, while multilayer were observed for longer time periods. The effect of the TPDA concentration on the thickness of the deposited layer was not very profound, however, the contact angle data exhibit importance of concentration on the surface coverage. The type of the solvent used in the formation of the monolayers was found an important parameter. Monolayers were formed with solvent having larger dielectric constants. Relatively thick multilayer was observed when benzene was used as the solvent, due to its quite low dielectric constant (hydrophobicity).

Highlights

Self-assembly has recently emerged as a new approach in chemical synthesis, nanotechnology, polymer science, The final morphology and thickness of a Self-assembled monolayers (SAMs) are reported to be extremely sensitive to experimental parameters including the type of precursor molecule, concentration, type of solvent and its quality, temperature and reaction time, etc
SAMs with amino end group were prepared by using N-(3-trimethoxysilylpropyl)diethylenetriamine (TPDA) molecule on the Si(001) surface
We have firstly looked at the effect of dipping time on the formation of TPDA molecules on the silicon surface

Summary

Introduction

Self-assembly has recently emerged as a new approach in chemical synthesis, nanotechnology, polymer science, The final morphology and thickness of a SAMs are reported to be extremely sensitive to experimental parameters including the type of precursor molecule, concentration, type of solvent and its quality, temperature and reaction time, etc. Solution concentration and solvent type on the formation of TPDA on Si(001) have been investigated.

Results

Conclusion