Removal of Cu(II)-ion over amine-functionalized mesoporous silica materials

Abstract

The capability for the adsorption of Cu(II)-ion with mesoporous silica materials, such as MCM-41, SBA-15 and XPD-2412, after functionalizing with amine groups, such as aminopropyltriethoxysilane (APTES), N(β-aminoethyl) γ-aminopropylmethyl dimethoxysilane (AEAPMDMS) and N 1-(3-(trimethoxysilyl)-propyl) diethylenetriamine (TMSPDETA), was investigated in this study. N 2 adsorption, XRD and elemental analysis methods were performed to gain an understanding of the structure and surface properties of the mesoporous silica materials. Of the absorbent materials, MCM-41, functionalized with APTES, showed the best activity for the adsorption of Cu(II)-ion. Compared with the mesoporous silica materials functionalized with APTES, those functionalized with AEAPMDMS and/or TMSPDETA showed lower adsorption capabilities, which may have been due to the locations of the amine groups. Most of the amine-organic domains were suggested should exist near the opening of channels or external surfaces. Furthermore, the rate of adsorption of Cu(II)-ions matched well with a pseudo-second-order kinetic model.