The merits of a low‐cost fabrication process, suitable band structure, excellent wettability to perovskite precursor, and outstanding stability ensure NiOx as a hole transport material with beneficial characteristics to construct high‐performance perovskite solar cells (PSCs). However, direct contact between perovskite and NiOx causes delamination and chemical instability and thus results in poor carrier transport and short device lifespan. Here, we propose a solution for this issue by introducing an organic salt additive 4‐(trifluoromethyl) benzylammonium formate (TFMBAFa) in the perovskite precursor to passivate perovskite film and NiOx@(2‐(3,6‐dimethyl‐9H‐carbazol‐9‐yl) ethyl) phosphonic acid (Me‐2PACz) composited hole transport layer (HTL), and thus construct a buffer layer between perovskite‐HTL interface. The effective diminishing of NiOx/perovskite interfacial reactions and defects results in enhanced carrier transport. Consequently, the target device achieves simultaneous improvements in power conversion efficiency (24.2%), storage stability (T100 > 1400 h), thermal stability (T80 > 1000 h), and operational stability (T70 > 850 h), where T100, T80, and T70 refer to the retention of 100%, 80%, and 70% of initial PCE, respectively. This work provides an effective strategy to advance the performance of NiOx‐based inverted PSCs.