Titanium Nitride Research Articles

Nanostructures/TiN layer/Al2O3 layer/TiN substrate configuration-based high-performance refractory metasurface solar absorber

Metasurface solar absorber serves as a kind of important component for green energy devices to convert solar electromagnetic waves into thermal energy. In this work, we design a new solar light absorber configuration that incorporates the titanium nitride substrate, aluminum oxide layer, titanium nitride layer, and the topmost refractory nanostructures. The metasurface absorber based on this configuration can achieve an average spectral absorption of over 91% and a total solar radiation absorption of 91.5% at ultra-wide wavelengths of 300–2500 nm. It is discovered that the excellent performance of the proposed metasurface absorber is attributed to the synergistic effects of surface plasmonic effect and Fabry–Pérot (FP) cavity resonance by comprehensive analysis of the simulated field distributions. Furthermore, the effect of geometrical parameter of the proposed configuration on absorber performance is studied, indicating the proposed configuration possesses a large fabrication tolerance. Moreover, the proposed configuration is not sensitive to the polarization direction and the angle of incident light. It is also found that the use of other refractory metal materials and other shapes as the topmost absorbent nanostructures also have good results with this configuration. This work can offer a universal platform for constructing and guiding the design of refractory metasurface solar absorbers.

Influence of Ti Layers on the Efficiency of Solar Cells and the Reduction of Heat Transfer in Building-Integrated Photovoltaics

This study examined the potential application of metallic coatings to mitigate the adverse effects of ultraviolet (UV) and infrared (IR) light on photovoltaic modules. Titanium coatings were applied on low-iron glass surfaces using magnetron sputtering at powers of 1000, 1250, 1500, 1750, 2000, and 2500 W. The module with uncoated glass served as a reference. The Ti layer thickness varied from 7 nm to 20 nm. Transmittance and reflectance spectra were used to calculate visible light transmittance Lt, UV light transmittance Ltuv, solar transmittance g, and visible light reflectance Lr. The obtained parameters indicated that the thinnest Ti layer (1000 W) coating did not significantly affect light transmittance, but thicker layers did, altering the Lt, g, and Lr factors. However, every sample noticeably changed Ltuv, probably due to the natural formation of a UV-reflective thin TiO2 layer. The differences in fill factor (FF) were minimal, but thicker coatings resulted in lower open-circuit voltages (Uoc) and short-circuit currents (Isc), leading to a reduction in power conversion efficiency (PCE). Notably, a Ti coating deposited at 2500 W reduced the power of the photovoltaic module by 78% compared to the uncoated sample but may protect modules against the unwanted effects of overheating.

Fabrication of TiN-doped Ti nanocomposites with high strength and ductility by plasma-assisted ball milling and laser powder bed fusion

An efficient method to fabricate titanium nitride (TiN)-doped titanium (Ti) nanocomposites through a combination of plasma milling, plasma spheroidization, and laser powder bed fusion (LPBF) was developed to obtain Ti-based materials with high strength and ductility from commercially pure titanium (CP-Ti). Nitrogen plasma milling and plasma spheroidization were used to fabricate Ti-TiN nanocomposites, which were mixed with CP-Ti powder at a 1:9 ratio and printed by LPBF forming. The resulting materials possessed a dual-scale morphology with both coarse lath-like and fine acicular-like grains. The Ti-TiN nanocomposites possessed higher hardness and tensile strength and lower ductility than those of the control sample without TiN. The mechanical properties of the LPBF-printed Ti-TiN nanocomposites were improved compared with those of LPBF-printed CP-Ti because of the TiN particles and resulting dual-scale structure. Nitrogen plasma milling provides a simple route to fabricate TiN nanophase-reinforced Ti-based nanocomposites suitable for LPBF printing.Graphical

Development of Titanium Dioxide Coating for Self-Cleaning Photovoltaic Panels

Amid escalating global energy demands and environmental concerns, the transition to renewable sources like solar power is imperative. Despite the advancements in photovoltaic (PV) technology promising increased efficiency, soiling on PV panels—composed of dust, bird droppings, and contaminants—poses a significant challenge, obstructing sunlight and reducing energy conversion efficiency. Building upon existing research on titanium dioxide (TiO2) nanoparticle coatings, our study investigates their super-hydrophilic and anti-soiling characteristics to enhance self-cleaning capabilities in solar applications. Furthermore, our research investigates the application of (3-aminopropyl)trimethoxy silane as an interlayer to reinforce the adherence of the TiO2 coating to PV panel glass, thereby enhancing its durability. Preliminary results highlight the coating’s exceptional super-hydrophilic properties, with water contact angle measurements less than 10°, indicative of TiO2’s strong water affinity. Spectrophotometer measurements show that the developed coating maintains high optical transmittances for the wavelength range from 350 to 800 nm, which is the most crucial factor for energy conversion in solar panels. Our contributions aim to advance solar energy technologies and support the shift towards more sustainable energy solutions, highlighting the role of innovative materials science in addressing solar power’s operational challenges.

Oxidation Behaviour of TiC/TiN Coatings Deposited by Chemical Vapor Deposition (CVD): Mechanisms, Structures, and Properties

This review explores the oxidation behavior of Titanium Carbide (TiC) and Titanium Nitride (TiN) coatings deposited by Chemical Vapor Deposition (CVD), with a focus on their industrial applications as wear-resistant coatings for cutting tools. It examines effect of process parameters—such as temperature, pressure, precursor composition, and substrate preparation—on formation and performance of TiC/TiN coatings. The review evaluates the microstructural characteristics of these coatings, including crystal structure, using X-ray diffraction analysis. Also, estimates the mechanical properties such as hardness, wear resistance, and adhesion strength. Additionally, the review covers the thermal stability of TiC/TiN coatings, emphasizing their ability to maintain structural integrity at high temperatures, which is essential for the performance of cutting tools and other industrial components. A major focus is the oxidation behavior of TiC/TiN coatings, including the impact of coating composition, deposition methods, and environmental conditions. The review details oxidation kinetics and mechanisms, revealing various stages of oxidation at different temperatures. It also examines oxide scale morphology and its effect on coating properties. Finally, this review reveals the importance of alloying elements, like silicon, in improving oxidation resistance. Composite coatings such as TiSiN and TiSiCN are shown to offer better high-temperature stability compared to traditional TiN coatings. The effects of coating thickness and the benefits of multilayer coatings for enhanced oxidation resistance are also discussed.

Performance enhancement of MOCVD grown Zn-doped β-Ga2O3 Deep-Ultraviolet photodetectors on silicon substrates via TiN buffer layers

Integrating β-Ga2O3-based devices on silicon substrates faces challenges due to lattice and thermal expansion mismatches, leading to performance-degrading defects. Therefore, this work explores the utilization of a titanium nitride (TiN) buffer layer in order to enhance the performance of MOCVD grown Zn-doped β-Ga2O3-based deep-ultraviolet (DUV) photodetectors (PDs) on silicon substrates with 12, 24, and 36 sccm diethylzinc (DEZn) flow rates. The XPS depth profiles revealed the presence of TiN buffer layer in β-Ga2O3/TiN/Si films, which served as a diffusion barrier during deposition, preserving interface integrity and reducing defect density. Zn-doped β-Ga2O3/TiN/Si based DUV PDs revealed remarkable results. The 12 sccm Zn-doped β-Ga2O3/TiN/Si PDs demonstrated an exceptional maximum responsivity of 31.4 A/W, which is 7 times higher compared to the undoped β-Ga2O3/TiN/Si (4.47 A/W) under a 5 V bias and 240 nm wavelength illumination. This PD exhibited the detectivity of 1.68 × 1013 Jones and EQE of 1.63 × 104 %. This PD possess quick rise time of 6.5 s and fall time of 0.5 s. The energy band diagram for Zn-doped β-Ga2O3/TiN/Si metal–semiconductor-metal type PDs is discussed. This work demonstrates that TiN buffer layers and Zn doping significantly improve the performance and reliability of β-Ga2O3-based DUV photodetectors on silicon substrates.

Influence of punch coating surface properties on sticking during the tableting process

Introduction The present study evaluates the sticking propensity of Uncoated steel, and chromium nitride (CrN), zirconium nitride (ZrN), titanium nitride (TiN) and Ultracoat punch coatings during the tableting process of microcrystalline cellulose (MCC) conducted on a Manesty® F3 single station tableting press. Methods Surface properties including surface roughness, surface free energy (SFE) and its components, the atomic percentage of surface polar functional groups and oxides measured with X-ray photoelectron spectroscopy were used to characterize the surface propensity to sticking. Results After five hours of tablet pressing, MCC powder particles were found to adhere to the TiN coated and the uncoated steel punches. Surface analysis show that surface roughness of all the tested punches was similar. The Lewis base SFE component (LB-comp) was found to govern the acid-base interactions of the tested surfaces, and its value was higher for punch surfaces affected by sticking. The surfaces exhibiting higher LB-comp are more prone to strong acid-base interactions with water molecules that evaporate from the powder bed during compression. Therefore, these surfaces adsorbed water and allow sticking through capillary adhesion force. Conclusion The total atomic percentage of the surface polar functional groups (PFG) and oxides was also high for the surfaces that stick to MCC during tableting, suggesting that hydrophilic molecules on the punch surface favor sticking.

Investigation of Titanium Nitride as an Effective Interphase for Carbon-Fiber-Reinforced Silicon Carbide Ceramic Matrix Composites.

Ceramic matrix composites (CMCs) have played a significant role in increasing the efficiency of gas turbine engines. CMCs combine the high temperature resistance of ceramics with the high mechanical strength of ceramic fibers into a single unit. Interphase layers are a crucial component in CMCs, as they prevent ceramic fibers from oxidation and introduce strengthening mechanisms into the composite. Hexagonal boron nitride and pyrolytic carbon are the most commonly used interphase layers in the aerospace industry. Other than that, very few materials have been evaluated as interphase layers. In this study, we explore the possibilities of using titanium nitride as an interphase layer in single-tow CMCs (mini composite) representative of a unidirectional composite at a smaller scale. T-300 carbon fibers were coated with TiN by atmospheric pressure chemical vapor infiltration using TiCl4, N2, and H2. The deposition temperature, precursor flow rate ratio, total precursor flow rate, and deposition time were optimized to obtain high-quality coatings. The best coating was produced at 800 °C, 4:1 H2 [TiCl4]/N2 ratio, 125 standard cubic centimeters per minute (N2 + H2 [TiCl4]) total flow precursor flow rate, and 2 h of deposition time. At these conditions, the coatings displayed good fiber coverage, good fiber adhesion, minimum fiber linkage, and minimum surface roughness. There was minimum fiber degradation after TiN coating, with a retention of 95% of the initial Young's modulus and 26% of the ultimate tensile strength of the carbon fiber. Adding the TiN interphase coating to the Cf/SiC CMC increased the ultimate tensile strength of the composite by 1122% and Young's modulus by 150%.

CMOS-compatible plasmonic magnetic field sensor: An alternative approach using ultra-compact MIM configuration

This paper introduces a novel magnetic field sensor (MFS) that utilizes a metal-insulator-metal (MIM) waveguide integrated with a resonator structure and incorporates water-based Fe3O4 magnetic fluid. The sensor uses titanium nitride (TiN) as the plasmonic material which offers numerous advantages over conventional noble plasmonic materials. The sensor takes advantage of the tunable optical properties of the magnetic fluid and TiN to detect changes in the external magnetic field and quantify the magnetic field strength which has been demonstrated using the Finite Element Method (FEM). Our proposed MFS exhibits a high sensitivity of 11.97 pm/Oe, a narrow-band full-width half maximum of 93.66 nm, and a resolution of 8.36 × 10−4 Oe. The sensor is also compatible with complementary metal oxide semiconductor (CMOS) fabrication techniques, which enables chip-scale integration and low-cost production. The sensor can be used for various applications in navigation, military, space, healthcare, and beyond.

INFLUENCE OF THE RATIO OF GASE CONSUMPTION N<sub>2</sub>/Ar AND MAGNETRON POWER ON THE DENSITY AND STOICHIOMETRIC COMPOSITION OF TIN<sub>X</sub> FILMS SYNTHESIZED BY MAGNETRON SPUTTERING METHOD

The films of titanium nitride were deposited by direct current magnetron sputtering on the surface of singlecrystalline silicon samples in an Ar-N2 atmosphere for use as a diffusion barrier. The thickness and density of films were measured by X-ray reflectometry. The design of the MAGNA TM-200-01 installation has been changed to increase the supply of nitrogen into the chamber. The influences of sputtering conditions, including the flow rate of nitrogen and argon gases and their N2 /Ar ratios in the range of 1–60 in the chamber, magnetron power of 690–1400 W on the formation of TiNx films, their density and stoichiometric composition, were studied. It is shown that the value of x is affected not only by the N2 /Ar gas flow rate ratio, but also by the magnetron power. At the sputtering parameters 1200 W, N2 /Ar = 30, 0.8 Pa, 320 s and 100°C, a maximum density of 5.247 g/cm3 of a film was achieved, which corresponds to the composition TiN0.786 = Ti56N44. The presence of nanocrystalline film of titanium nitride and the absence of a nanocrystalline titanium phase were confirmed by photographic X-ray diffraction. It was found that for the synthesis of titanium nitride as close as possible to the stoichiometric composition TiN0.770 - TiN0.786, it is necessary to use magnetron power in the range of 900–1200 W, nitrogen rate of 30 cm3 /min with low argon flows of 1–5 cm3 /min.

Dramatic Enhancement Enabled by Introducing TiN into Bread-like Porous Si-Carbon Anodes for High-Performance and Safe Lithium Storage.

Doping modifications and surface coatings are effective methods to slow volume dilatation and boost the conductivity in silicon (Si) anodes for lithium-ion batteries (LIBs). Herein, using low-cost ferrosilicon from industrial production as the energy storage material, a bread-like nitrogen-doped carbon shell-coated porous Si embedded with the titanium nitride (TiN) nanoparticle composite (PSi/TiN@NC) was synthesized by simple ball milling, etching, and self-assembly growth processes. Remarkably, the porous Si structure formed by etching the FeSi2 phase in ferrosilicon alloys can provide buffer space for significant volume expansion during lithiation. Highly conductive and stable TiN particles can act as stress absorption sites for Si and improve the electronic conductivity of the material. Furthermore, the nitrogen-doped porous carbon shell further helps to sustain the structural stability of the electrode material and boost the migration rate of Li-ions. Benefiting from its unique synergistic effect of components, the PSi/TiN@NC anode exhibits a reversible discharge capacity up to 1324.2 mAh g-1 with a capacity retention rate of 91.5% after 100 cycles at 0.5 A g-1 (vs fourth discharge). Simultaneously, the electrode also delivers good rate performance and a stable discharge capacity of 923.6 mAh g-1 over 300 cycles. This research can offer a potential economic strategy for the development of high-performance and inexpensive Si-based anodes for LIBs.

A HYBRID MEREC-TOPSIS APPROACH FOR THE IMPROVEMENT OF PHYSICAL VAPOUR DEPOSITED TITANIUM CARBO-NITRIDE COATING

Titanium carbo-nitride (TiCN) comes under the metal nitride group which can provide a combined property of titanium carbide (TiC) and titanium nitride (TiN) coating. TiCN Coating possess an excellent mechanical and tribological, properties which leads its application in many industries particularly in the Automotive and aerospace industries. TiCN films can be very hard and strong based on the composition and synthesis process. Physical Vapor Deposition (PVD) technique is widely used for the preparation of thin film coating because of its ability to precisely control the composition and thickness of the coatings. The properties of the developed coating significantly affect by the PVD process parameters and their levels. Multi-Criteria Decision Making (MCDM) methods are widely used in many sectors for the selection of process parameters based upon some specific criteria. In the present work TiCN coatings were synthesized by using one of the most widely used PVD method called magnetron sputtering. L16 orthogonal array was used as a design of experiment for the experimental work by varying the sputtering process parameters like bias voltage, N2 flow rate and substrate to target distance. After the synthesis, the developed films were tested using atomic force microscopy (AFM), Scanning electron microscopy (SEM), and Nanoindentation. From the characterization three response parameters such as hardness (H), Modulus of elasticity (E) and surface roughness (Ra) of the coating has been considered. A hybrid method based on improved removal effects of criteria- technique for order performance by similarity to ideal solution (MEREC-TOPSIS) approach has been considered for the for the process parameters selection. The results have also been compared with other weight calculation techniques. In all the cases it is observed that experiment no 16 and 15 have got the 1st and second rank respectively. However, experiment no 1 is the last rank in all the cases. From the correlation analysis it is found a strong positive correlation between MEREC-TOPSIS and other methods. The method provides a significant advancement in the selection of optimal parameters, ensuring enhanced coating properties crucial for industrial applications.

Enhanced SWIR Absorption in PMMA‐Coated TiN‐Based Metamaterial

AbstractAchieving highly efficient absorption in the short wavelength infrared (SWIR) spectral region is crucial for advancing numerous technologies. SWIR absorption enhances energy harvesting in solar cells, improves the sensitivity of infrared sensors, and enables precise control of thermal radiative properties in thermal emission devices. These advancements are essential for applications such as thermal imaging, night vision, and thermophotovoltaic systems. The study presents a simple, cost‐effective design of a polymer‐coated multilayer perfect absorber (MPA) metamaterial optimized for the SWIR spectral region. The proposed MPA structure is composed of four distinct layers: a top layer made of polymethyl methacrylate (PMMA) polymer, a second layer featuring arrays of circular titanium nitride (TiN) disks, a dielectric middle layer consisting of a pure zinc oxide (ZnO) film, and a bottom metallic layer formed by a thin film of TiN. The results demonstrate that the MPA achieves near‐perfect absorption, with a remarkable 99% efficiency centered at a wavelength of 1.3 µm. The absorption properties are further investigated with respect to various structural parameters to ensure better performance of the absorber. These absorbers hold great promise for applications in energy absorption, infrared sensing, thermal emission, and related fields.

A Roadmap Towards Safe and Sustainable by Design Nanotechnology: Titanium Dioxide Coated Photocatalytic Depolluting Surfaces Production by the ASINA know-how.

This report, the second of its kind from ASINA project, aims at providing a roadmap with quantitative metrics for Safe(r) and (more) Sustainable by Design (SSbD) solutions for titanium dioxide (TiO2) nanomaterials (NMs). We begin with a brief description of ASINA’s methodology across the product lifecycle, highlighting the quantitative elements, such as the Key Performance Indicators (KPIs). We then propose a decision support tool for implementing SSbD objectives across various dimensions—functionality, cost, environment, and human health safety. This is followed by the main innovative findings, a consolidation of the technical processes involved, design rationales, experimental procedures, tools and models, used and developed, to deliver photocatalytic depolluting surfaces by spray- finishing techniques based on TiO2 NMs formulations. The roadmap is thoroughly described to inform similar projects through the integration of KPIs into SSbD methodologies, fostering data-driven decision-making. While specific results are beyond this report's scope, its primary aim is to demonstrate the roadmap (SSbD know-how) and promote SSbD-oriented innovation in nanotechnology. Finally, we provide a comparison of the approaches followed in two case studies that target different industrial sectors. This case-specific SSbD assessments provide a concrete exemplification of the addressed methodology that contributes to the efforts towards attaining a common roadmap for implementing SSbD solutions aligned with the EU’s Green Deal objectives.

Nano Titanium Coating to Improve Platelet Rich Fibrin

Nano Titanium Coating to Improve Platelet Rich Fibrin

METALLOGRAPHIC ANALYSIS OF NON-METALLIC INCLUSIONS IN SEMI-KILLED STEEL (GRADE 25G2S) DEOXIDIZED WITH A COMPLEX ALLOY Fe-Si-Mn-Al

This study presents a metallographic analysis of non-metallic inclusions in steel samples obtained from six different heats of the oxygen converter shop at JSC «Qarmet» and under laboratory conditions at the Karaganda Industrial University. The investigation focused on semi-killed steel samples deoxidized using traditional technology under industrial conditions and with a complex alloy containing Fe-Si-Mn-Al under laboratory conditions, aiming to identify the types and assess the level of contamination by non-metallic inclusions. The results revealed the presence of various types of non-metallic inclusions, such as corundum, chromite spinel, chromium oxides, as well as titanium nitrides and carbonitrides. The degree of contamination by non-metallic inclusions ranged from 2 to 3 points. The analysis showed that the use of a complex Fe-Si-Mn-Al alloy instead of traditional deoxidizers can affect the quantitative and qualitative composition of non-metallic inclusions. It was established that the complex alloy promotes the formation of more stable inclusion phases, which can positively impact the mechanical properties of the steel. It was also found that different production technologies and the use of deoxidizers can significantly influence the quantity and types of non-metallic inclusions, requiring further study and optimization of technological processes. Therefore, the results of this study can be valuable for metallurgical enterprises in selecting optimal steel deoxidation methods and improving steel quality, as well as for further scientific research in the fields of metallurgy and materials science.

Tunable Polarization-Selective Absorption by Gating Ultrathin TiN Films in the Near-Infrared Region

Ultrathin titanium nitride (TiN) is a novel material platform for constructing active metasurfaces in the near-infrared region (NIR). Here, we realized tunable polarization-selective absorption by gating ultrathin TiN in an Ultrathin TiN Grating Metasurface (UTGM) and a gold resonator/TiN film Hybrid Metasurface (GTHM), respectively. The TM wave absorption (0.96) was much larger than that of the TE wave in the UTGM. When the carrier density decreased by 12%, the near-perfect TM absorption peak blue-shifted by 0.3 μm. Similarly, the linear dichroism (0.96) peak in GTHM blue-shifted by 0.12 μm when gating ultrathin TiN film. Active metasurfaces with tunable polarization-selective absorption have huge potential in dynamic integrated electro-optic devices in NIR.

Microwave loss and kinetic inductance of epitaxial TiN films

Abstract Low microwave loss and regulatable kinetic inductance are two key characteristics of superconducting films to manufacture high-performance quantum devices. Epitaxial titanium nitride (TiN) thin films have been found to exhibit significant advantages in these two aspects. In this paper, we investigated into the dielectric loss and kinetic inductance of epitaxial TiN films, which were prepared on both silicon and sapphire substrates with different temperatures. Crystal structure, surface morphology, and superconducting properties were characterized systematically. The radio-frequency response of microwave resonators made of TiN films was studied at low temperatures to extract the information of kinetic inductance and quality factor. We obtained the highest internal quality factor up to 1.6 × 10 6 at single photon regime and achieved a regulation of kinetic inductance exceeding 16 times by altering the substrate and the sputtering temperature of the TiN films. This work not only provides an essential foundation for the precise design and preparation of low-loss TiN resonators for superconducting quantum bits, but also demonstrates TiN film as an excellent material platform with both low microwave loss and high kinetic inductance that can be applied in other fields such as microwave kinetic inductance detectors.

Nonprecious Single Atom Catalyst for Methane Pyrolysis.

The development of a suitable catalytic system for methane pyrolysis reactions requires a detailed investigation of the activation energy of C-H bonds on catalysts, as well as their stability against sintering and coke formation. In this work, both single-metal Ni atoms and small clusters of Ni atoms deposited on titanium nitride (TiN) plasmonic nanoparticles were characterized for the C-H bond activation of a methane pyrolysis reaction using ab initio spin-polarized density functional theory (DFT) calculations. The present work shows the complete reaction pathway, including energy barriers for C-H bond activation and dehydrogenated fragments, during the methane pyrolysis reaction on catalytic systems. Interestingly, the C-H bond activation barriers were low for both Ni single-atom and Ni-clusters, showing the energy barriers of ~1.10 eV and ~0.88 eV, respectively. Additionally, single-atom Ni-TiN showed weaker binding to adsorbates, and a net endothermic reaction pathway indicated that the single-atom Ni-TiN was expected to resist coke formation on its surface. However, these Ni single-atom catalysts can sinter, aggregate into a small cluster, and form a coke layer from the highly exothermic reaction pathway that the cluster takes despite the facile reaction pathway.

Engineering Carrier Density and Effective Mass of Plasmonic TiN Films by Tailoring Nitrogen Vacancies.

The introduction of nitrogen vacancies has been shown to be an effective way to tune the plasmonic properties of refractory titanium nitrides. However, its underlying mechanism remains debated due to the lack of high-quality single-crystalline samples and a deep understanding of electronic properties. Here, a series of epitaxial titanium nitride films with varying nitrogen vacancy concentrations (TiNx) were synthesized. Spectroscopic ellipsometry measurements revealed that the plasmon energy could be tuned from 2.64 eV in stoichiometric TiN to 3.38 eV in substoichiometric TiNx. Our comprehensive analysis of electrical and plasmonic properties showed that both the increased electronic states around the Fermi level and the decreased carrier effective mass due to the modified electronic band structures are responsible for tuning the plasmonic properties of TiNx. Our findings offer a deeper understanding of the tunable plasmonic properties in epitaxial TiNx films and are beneficial for the development of nitride plasmonic devices.