The TiAlSiN coating has garnered significant interest due to its exceptional hardness, high oxidation resistance temperature, robust film-substrate bond strength, excellent wear resistance, and superior thermal stability. The energetic ion beam technology has emerged as a potent method for fabricating thin films. In this study, TiAlSiN films were deposited utilizing magnetic filtered cathode vacuum arc (FCVA) and high power pulsed magnetron sputtering (HiPIMS), and their respective structures and properties were meticulously investigated and contrasted. Upon comparative analysis, it was observed that the elemental composition of the FCVA films underwent a pronounced change with the same. Depending on the desired film thickness, the deposition rate of the FCVA system was found to be superior over the same duration. The crystallographic structure of the films fabricated by both systems predominantly featured an fcc-(Ti,Al)N phase. Notably, at an N2 flow rate of 40 sccm, the film deposited via HiPIMS demonstrated remarkable hardness (27.04GPa), an elevated H/E⁎ ratio (0.103), and superior wear resistance (7.24×10-6 mm3/N∙m). The films produced by these two deposition methods exhibited discernible differences and clear trends in hardness, adhesion strength, and tribological properties. This research provides a valuable reference for selecting the most appropriate deposition process and parameters based on the desired attributes of the coatings.