Polycrystalline β-FeSi 2 thin films of about 600 nm were prepared by simultaneous electron beam evaporation of Si and Fe ( 1.6 < Si Fe < 2.4 ) onto Al 2O 3-ceramic and saphire substrates. The films were deposited at 100°C and subsequently annealed between 500 and 950°C. Films crystallized below 870°C predominantly consist of the semiconducting phase β-FeSi 2 with a p-type conductivity. At higher temperatures only the metallic monosilicide ϵ-FeSi could be detected probably due to a chemical reaction of Fe, Si and the substrate material. The influence of the crystallization temperature and of deviations from the stoichiometric composition Si Fe = 2 on the grain size and some electrical and optical properties are studied. A Si Fe ratio between 2.1 and 2.2 is correlated with maximum grain sizes and thermoelectric power values and minimum conductivities. A minimum optical subband absorption below the gap energy is also characteristic for this composition. The Hall voltage between room temperature and 10 K was too low to be resolved. Therefore Hall mobilities are estimated to be rather small (≤ 0.1–0.2 cm 2/Vs) and high defect densities and carrier concentrations are concluded. A photoconductive effect could not be demonstrated without any doubt. Due to these results the suitability of such films for photovoltaic applications seems to be questionable up to now.
Read full abstract