The heteroepitaxial growth of β-SiC on silicon and TaC on single-crystal tantalum films for optical applications is reported. Both types of films were deposited by employing a horizontal chemical vapor deposition reactor at temperatures above 1200 °C. The β-SiC comprises single crystals with diameters greater than 2 in. The TaC was grown on single crystals of tantalum with (100) orientation and a crystal diameter greater than 0.5 in. Both materials exhibited reflectances greater than 40% at a wavelength of 100 nm and at angles of incidence less than approximately 70°. These measurements were made on the as-grown samples and are remarkable results given that the samples were not polished to a flatness of less than λ/80 r.m.s. in the visible region.