Photochemical deposition has been attracting increasing attention for preparing nano-catalysts due to its mild reaction conditions, simplicity, green and safe characteristics, and potential for various applications in photocatalysis, thermal catalysis, and electrocatalysis. In this review, we provide an overview of recent advances in photochemical deposition methods for fabricating heterogeneous catalysts, and summarize the factors that influence the nucleation and growth of metal nanoparticles during the photochemical process. Specifically, we focus on the various factors including surface defects, crystal facets, surface properties and the surface plasmon effect on the size, morphology and distribution control of metal and metal oxide nanoparticles on semiconductors. The control of the photogenerated charges and the triggered photochemical reactions have been proved to be significant in the photochemical deposition process. Besides, the applications of the obtained catalytic materials in thermal catalysis and electrocatalysis is highlighted, considering that many reviews have covered photocatalysis applications. We first introduce the principle of photodeposition, nucleation and growth theory, and factors affecting photodeposition. Then, we introduce photodeposition methods that can achieve "controlled" photodeposition from a strategic perspective. Finally, we summarize the fruitful results of controlled photodeposition and provide future prospects for the development of controlled photodeposition technologies and methods, as well as the deepening and expansion of applications.