The growth of SrRuO_3 (SRO) thin film with high-crystallinity and low residual resistivity (RR) is essential to explore its intrinsic properties. Here, utilizing the adsorption-controlled growth technique, the growth condition of initial SrO layer on TiO_2-terminated SrTiO_3 (STO) (001) substrate was found to be crucial for achieving a low RR in the resulting SRO film grown afterward. The optimized initial SrO layer shows a c(2 times 2) superstructure that was characterized by electron diffraction, and a series of SRO films with different thicknesses (ts) were then grown. The resulting SRO films exhibit excellent crystallinity with orthorhombic-phase down to t approx 4.3 nm, which was confirmed by high resolution X-ray measurements. From X-ray azimuthal scan across SRO orthorhombic (02 ± 1) reflections, we uncover four structural domains with a dominant domain of orthorhombic SRO [001] along cubic STO [010] direction. The dominant domain population depends on t, STO miscut angle (alpha ), and miscut direction (beta ), giving a volume fraction of about 92 % for t approx 26.6 nm and (alpha , beta ) approx (0.14^{mathrm{o}}, 5^{mathrm{o}}). On the other hand, metallic and ferromagnetic properties were well preserved down to tapprox 1.2 nm. Residual resistivity ratio (RRR = rho ({mathrm{300 K}})/rho ({mathrm{5K}})) reduces from 77.1 for tapprox 28.5 nm to 2.5 for tapprox 1.2 nm, while rho ({mathrm{5K}}) increases from 2.5 upmu Omega cm for tapprox 28.5 nm to 131.0 upmu Omega cm for tapprox 1.2 nm. The ferromagnetic onset temperature (T'_{mathrm{c}}) of around 151 K remains nearly unchanged down to tapprox 9.0 nm and decreases to 90 K for tapprox 1.2 nm. Our finding thus provides a practical guideline to achieve high crystallinity and low RR in ultra-thin SRO films by simply adjusting the growth of initial SrO layer.
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