ABSTRACT Coating a suitable material on substrate in thickness of nano to micro metres is a great interest for the scientific community. A hard coating is developed under the significant composition of different natured atoms, where their certain transition states under involved energy and engaged force favour the binding. In the binding mechanism of Ti atom and N atom, a suitable filled state electron belonging to the outer ring of N atom undertakes another clamp of suitable unfilled energy knot belonging to the outer ring of Ti atom. Ti and N atoms develop the structure hard when they locate a common ground point. Common ground points of binding atoms exist between the original ground points of gaseous atom and solid atom. In depositing TiN coating, binding between Ti atoms occurs due to the different thermal expansions of lattices. Here, one Ti atom is deposited and one Ti atom is being deposited. In random arc-based vapour deposition system, depositing TiN coating at substrate depends on several parameters. In addition to intrinsic behaviour of Ti and N atoms, different properties of materialised coating depend on the nature of engaged forces under the involved energy. The involved non-conservative energy also engages a non-conservative force.