The electrodeposition of two-dimensional Sn micropatterns without whisker growth was investigated using an aqueous acid bath. Polyethylene glycol suppressed the growth of Sn normal to the surface of a Cu foil substrate and flat Sn micropatterns were successfully obtained on various different photoresist-patterned Cu foils. The current efficiency of Sn electrodeposition was higher than 97% for all samples, although the pH of the solution was about 0.0, indicating that the overpotential of H2 evolution on the Sn/Cu substrate was quite large. Sn micropatterns, in the form of both lines and circles, showed a slight macroscopic stress relaxation effect. In the present work, we demonstrate the electrodeposition of two- dimensional Sn micropatterns on Cu foils from an aqueous acid bath utilizing a photolithographic technique. The effect of polyethylene glycol on the surface morphology of Sn and the potential change during electrodeposition were also investigated. This work provides general guidelines for the patterned electrodeposition of other types of metals or alloys. Furthermore, we evaluated the stress relaxation effect during lithiation and delithiation using two-dimensional Sn micropatterns as a reference. expose a single side with an area of 20 mm × 20 mm. The masked Cu foils were used as the working electrodes and a carbon substrate was used as the counter electrode. The distance between the working and counter electrodes was set at 10 mm. A saturated calomel electrode (SCE) was used as the reference electrode. The measured poten- tials were converted to values versus the standard hydrogen electrode (SHE) using the following relationship: ESCE= +0.244 V vs. SHE. Sn plating on the Cu surface was conducted at 10 mA cm −2 (effective surfacearea)withapotentiostat/galvanostat(HokutoDenkoCo.,Ltd., Japan, HZ-3000) at room temperature with stirring at 100 rpm. The Sn morphology was observed using afield emission scanning electron microscope (FE-SEM: Hitachi Ltd., S-4300). Charge-discharge tests were conducted at 90 μ Ac m −2 (effec- tive surface area) and room temperature with a charge-discharge unit (Hokuto Denko Co., Ltd., Japan, HJ-1001 SD8) to study the effect of macroscopic stress relaxation of Sn micropatterns during lithia- tion and delithiation. The cutoff potentials were 0.001 V and 2 V vs. Li/Li + . A coin cell was constructed in an Ar atmosphere glove box (M. Braun Inertgas-Systeme GmbH, Germany, MB150-B). Sn- deposited Cu foils and Li metal were used as the positive and negative electrodes, respectively, and 1 M LiPF6 solution of ethylene carbonate and dimethyl carbonate (1:2, v/v) was used as the electrolyte.
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