SummaryIn this paper, the monolayer single‐walled carbon nanotube (SWCNT) interconnects are modeled and investigated comprehensively. On the basis of the ratio of the resistance–capacitance values between Cu and SWCNT interconnects, it is demonstrated that the monolayer SWCNT interconnect can provide comparable and even better performance than Cu wire at the 19 nm technology node and beyond. Furthermore, the relative stability analysis is carried out for the monolayer SWCNT interconnects by investigating the relative position of the Nyquist diagram with respect to the critical point (−1, 0). It is shown that the relative stability can be improved by increasing the length and decreasing the SWCNT diameter. Meanwhile, the relative stability also can be improved with the technology advancement. Finally, the crosstalk effects are studied on the basis of the tri‐interconnect architecture. As the monolayer SWCNT interconnects possess much smaller capacitance, the signal integrity can be improved, with the peak noise voltage suppressed greatly. Copyright © 2014 John Wiley & Sons, Ltd.
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