Silver Ion Implantation Research Articles

Silver ion beam formation and implantation on nano-pyramidal template for isolated nano-dot formation

We report the development of silver (Ag) ion-beam by Electron Cyclotron Resonance (ECR) plasma sputtering and synthesis of Ag nano-dot arrays by implantation of the Ag+ ions on a pre-fabricated silicon nano-template. Ag atoms are mixed with the argon plasma by sputtering a biased silver plate placed inside the ECR chamber. The extracted and mass-separated Ag+ ions are transported to a UHV target chamber for implantation. The variation of the flux of Ag+ ion beam is studied by changing the various parameters, such as applied bias voltage of Ag plate, microwave power, argon gas pressure and specifically, the position of silver plate from the ECR plasma center. It is observed that the sputtering rate of Ag and thereby the final Ag beam current strongly depends on the applied bias and position of the plate. The dependence of microwave power and gas pressure on beam intensity is also investigated and explained in terms of ionization and mean free path of the ionized atoms. Finally, 6 keV Ag+ ions are implanted on pre-patterned nano-pyramidal templates to form an array of Ag nano dots on a large area, by exploiting the geometrical shape of the templates and the directionality of the ion beam.

Structure-dependent optical properties of Au/Ag irradiated TiN thin films

Titanium nitride (TiN) is an attractive alternative for modern and future photonic applications, as its optical properties can be engineered over a wide spectral range. In this study, we have used sequential implantation of gold and silver ions with varying ion fluence, as well as subsequent annealing, in order to modify the optical and plasmonic properties of TiN thin films and correlated this to their structural properties. Our investigations show that the columnar structure of the TiN films is partially destroyed upon implantation, but metallic Au and Ag nanoparticles are formed. The irradiation further induces a reduction of the lattice constant as well as changes the TiN stoichiometry and grain size. From the optical point of view, the implanted films possess less metallicity with increasing Ag fluence and losses several times lower than the as-deposited film, which can be correlated with the deficiency of nitrogen and additional defects. Subsequent annealing partially recovered the destroyed columnar structure, and the films become more metallic where the optical losses are much smaller in comparison to the as-implanted situation, being comparable to those of pure Au and Ag. In this way, by varying the implantation fluence of silver ions properly while keeping the gold fluence constant, we were able to optimize experimental parameters in such a way to ensure the formation of TiN with desirable optical performances.

Effect of Cu, Zn and Ag Ion Implantation on the Surface Modification of Bacterial Cellulose Films

The paper presents the preliminary results of cellulose modification by ion implantation. Three types of ions were implanted, i.e., copper, zinc and silver with fluences of 5 × 1014 and 5 × 1015 cm−2, respectively. The acceleration voltage of the implanted ions was 30 kV. The ion penetration depth profiles showed differences, especially in the Cu and Ag cases, due to the different ion beams of these elements. The implantation of cellulose with ions clearly changed the wettability of the material surface in the direction of hydrophobicity. The impact of implantation on the growth of the cellulose surface by mold fungi was also noticeable. Only the silver ion implantation had a negative effect on the growth of the Trichoderma viride fungus but did not cause a complete inhibition of growth. Cellulose implantation with Cu and Zn ions clearly stimulated the growth of fungi on the surface of the polymer.

Enhanced Antibacterial Effect on Zirconia Implant Abutment by Silver Linear-Beam Ion Implantation.

Peri-implant lesions, such as peri-implant mucositis and peri-implantitis, are bacterial-derived diseases that happen around dental implants, compromising the long-term stability and esthetics of implant restoration. Here, we report a surface-modification method on zirconia implant abutment using silver linear-beam ion implantation to reduce the bacterial growth around the implant site, thereby decreasing the prevalence of peri-implant lesions. The surface characteristics of zirconia after ion implantation was evaluated using energy dispersive spectroscopy, X-ray photoelectron spectroscopy, and a contact-angle device. The antibacterial properties of implanted zirconia were evaluated using Streptococcus mutans and Porphyromonas gingivalis. The biocompatibility of the material surface was evaluated using human gingival fibroblasts. Our study shows that the zirconia surface was successfully modified with silver nanoparticles by using the ion-implantation method. The surface modification remained stable, and the silver-ion elution was below 1 ppm after one-month of storage. The modified surface can effectively eliminate bacterial growth, while the normal gingiva's cell growth is not interfered with. The results of the study demonstrate that a silver-ion-implanted zirconia surface possesses good antibacterial properties and good biocompatibility. The surface modification using silver-ion implantation is a promising method for future usage.

Ионно-лучевое формирование серебросодержащей поверхности пористого кремния

The results of a study of the formation of a silver-containing porous layer on the surface of single-crystal silicon KEF-4,5 by ion-beam alloying are presented. A computer simulation of the process of ion doping of silicon with KEF-4,5, high-energy helium and silver ions was carried out using the TRIM/SRIM software package in order to determine the dose and energy neighborhoods of helium and silver ions necessary and sufficient in the experiment. The relief of the porous surface, the density of quasi-pores on the surface of implanted silicon, the elemental composition of the obtained porous composite silver-containing layers, taking into account the effect of intermediate heat treatment on it, are studied. The ion-beam formation of a silver-containing coating ensures the creation of a developed surface relief at the nanoscale with high reproducibility and controllability inherent in the ion doping method, which contributes to an increase in the yield of usable solar cell products. The technological modes of high reproducibility and controllability inherent in the ion doping method are determined based on the experimental data obtained for studying the relief of a porous surface and the density of quasi-pores on the surface of implanted silicon from the energy and dose of helium ions. Based on the study of the elemental composition of the quasi-porous composite silver-containing layer obtained by implantation of silver ions, the recommended parameters of implantation of silver ions have been established.

Investigating the optical response of titanium-nitride thin films after silver ion implantation and post-thermal annealing

The paper reports the study on dielectric functions of TiN films implanted with Ag ions and after annealing at 400 °C and 700 °C, employing spectroscopic ellipsometry technique. By using Drude-Lorentz modelling we have analysed and discussed in detail the evolution of screened and unscreened plasma frequency as well as Drude parameter. In comparison to as deposited film the real part of dielectric constant for Ag-implanted layers exhibits less negative values with increasing ion fluence implying the films possess less metallicity, whereas after annealing TiN becomes more metallic. Simultaneously, after implantation, the imaginary part is more than an order of magnitude lower than for the as deposited TiN and several times lower than that of Au and Ag. The magnitude of imaginary contribution of Ag-implanted TiN films decreases further after subsequent heat treatment at both 400 °C and 700 °C annealing temperatures. Although the differences in stoichiometry and microstructural changes, such as crystallite size, concentration of grain boundaries and defect density were assumed to be the major reason for the variation in optical properties of TiN, spectroscopic ellipsometry data exhibited much stronger effects than expected and indicated some other mechanisms could also be responsible for such behaviour.

Surface characterisation and silver release from Ti-6Al-4V and anodic TiO2 after surface modification by ion implantation

Surface modification of the implant surface via silver ion (Ag+) implantation shows promise in reducing the post-surgery infection rates. Silver was ion implanted into polished Ti-6Al-4V and the anodically oxidised Ti-6Al-4V surfaces at two implantation fluences, namely, 0.4 and 1.2 × 1017 ions/cm2. Anodic oxidation was carried out using the 0.5 M H2SO4 and 2.1 M H3PO4 electrolytes. This study aims to characterise the surfaces and to determine whether surface modification of Ti-6Al-4V via anodic oxidation improves the Ag+ release from the surfaces in vivo. The tested dosages had no appreciable effect on the final amount of stored silver for both studied TiO2 layers as supersaturation of the surface with silver occurs at low dosage. Ag+ release from the anodic TiO2 layers was independent of the electrolyte used to create the anodic layer. Polished Ti-6Al-4V surfaces showed a greater potential silver storage capacity relative to the anodic TiO2 samples since the concentration of silver stored at the surface was roughly proportional to the Ag+ dosage. Comparison of Ag+ release rates of all studied samples with literature to determine the potential antimicrobial effects showed that all studied conditions had the potential to be 100% antimicrobial.

Study the effect of silver ion implantation on the structural, optical, and electrical properties of copper oxide thin films: an experimental and theoretical approach

Study the effect of silver ion implantation on the structural, optical, and electrical properties of copper oxide thin films: an experimental and theoretical approach

Effect of silver ion implantation on antibacterial ability of polyethylene food packing films

Bacterial adhesion on medical instruments’ and food packages’ surfaces causes implanted infections, food spoilage and human disease, therefore attracts a lot of attention in the field of medical and food applications. Containing the initial adhesion of bacteria on the surface of the material plays an important role in reducing potential safety hazards. In this work, we investigate the influence of silver ion implantation with different doses on the antibacterial performance of the polyethylene (PE) films. It is found out that silver ion implantation will not color the PE films but can improve their surface hydrophilicity. The silver-implanted PE films show the ability to inhibit bacterial adhesion and have the bactericidal effect, both of which can be improved with increasing silver implantation dose. This method also proves relatively safe, because the silver ions are relatively stable. The results will introduce potential applications for ion implantation in the food packing and food accessible materials.

Regularities of PLA mechanical property modification under ion implantation conditions

The investigations of the surface physicochemical properties of polylactic acid (PLA) modified by argon, carbon and silver ion implantation to fluences of 1∙1014, 1∙1015 and 1∙1016 cm−2 and energies of 20 keV, 20 keV and 42 keV respectively are described. The projected ion ranges in the polymer matrix are estimated by the computer simulation with the TRIDYN code, as well as energies of electron and nuclear stopping are assessed according to the SRIM modelling. The microhardness and elastic modulus are established to be dependent on the degree of crystallinity of the material. It was found that the microdistortions and strains of the PLA crystal lattice increase after ion implantation due to the structural alteration and defect formation. Long-range effect expressed as bigger depth of modified surface layer than the ion range in the material is suggested as a result of the radiation-stimulated diffusion and thermal restructuring of the material.

Structure and properties of the surface layer of titanium alloys after silver ion implantation and ultrasonic treatment

The article considers the effect of ultrasonic exposure after the ion implantation of titanium alloys VT1-0 and VT6 silver on the thickness of the ion-leged layer, the distribution of silver by the thickness of this layer and the scalar density of dislocations in the subsurface layer. It has been established that for the alloy VT6 at the same parameters of the implantation regime there is a deeper penetration of silver ions compared to the alloy VT1-0. Directly under the ion-leged layer is formed a layer with an increased rocky density of dislocations. The ultrasonic treatment of the implanted layer on the alloys studied contributed to the deeper penetration of silver ions and the alignment of its concentration by the thickness of the surface layer of titanium alloys.

Surface property modification of biocompatible material based on polylactic acid by ion implantation

The investigations of the surface physicochemical and biological properties of polylactic acid modified by silver, argon and carbon ion implantation to doses of 1 × 1014, 1 × 1015 and 1 × 1016 ion/cm2 and energies of 20 keV (for C+ and Ar+) and 40 keV (for Ag2+) are described. X-ray photoelectron spectroscopy revealed that chemical bond ratio in polylactic acid is alternated indicating that different chemical processes take place depending on the implanted ion kind. Chemical reactions that occur during ion implantation of polylactic acid are proposed. X-ray diffraction analysis shows the degree of crystallinity decrease for all the ion types that leads to microhardness and elastic modulus decreasing. Silver is established to form metal nanoparticle into subsurface layer of polylactic acid with the average size of 2–3 nm. It was shown by atomic force microscopy that the higher irradiation doses the lower the surface roughness of polylactic acid that results in hydrophilicity improvement. The cytotoxicity investigation on three individual donor macrophages shows that Ag-implanted polylactic acid has no negative impact on the immune system cells and can be very promising material for biomedical application.

Effect of silver ion implantation on surface physicochemical properties of composite materials based on polylactic acid and hydroxyapatite

The investigation of surface physicochemical and biological properties of polylactic acid and hydroxyapatite and composite materials based on them modified by Ag 1 × 1015 ion/cm2 and 1 × 1016 ion/cm2 40 keV ion implantation is presented. X-ray analysis reveals that ion implantation of the above mentioned materials leads to crystallite size and degree of crystallinity increase. The intensity of -С = О line is found by IR-spectroscopy to be decreased that is associated with surface layer carbonization processes of PLA during ion implantation. Silver ion introducing is established to enhance hydrophobic properties of the materials; this process is accompanied by free surface energy decreasing. It is shown that cell viability of non-implanted PLA is comparable with a control sample and ion implantation negatively affects to cell viability. The investigated materials can be promising for biomedical application.

Effect implantation of silver ions on patterns of wear of titanium VT1-00

The results of the technical titanium VT1-00 wear resistance before and after ion implantation by silver with different grain size after intense plastic deformation are presented. It is shown that the increase in the grinding degree of the titanium VT1-00 original grain is accompanied by increase in the intensity of wear during friction. It is established that high-dose implantation of silver ions is effective to increase the wear resistance of large-grain structure titanium VT1-00. This is due to the formation on the friction surface of secondary structures containing fine-dispersed intermetaloids based on titanium and silver.

The Effects of Silver Ion Implantation on Structural and Morphological Performance of Hydroxyapatite Coatings

The Effects of Silver Ion Implantation on Structural and Morphological Performance of Hydroxyapatite Coatings

Sputtering of silicon surface by silver-ion implantation

The article describes the study of Si surface sputtering with the low-energy high-dose implantation by Ag+ ions with energy E = 30 keV and current density J = 8 μA/cm2. The radiation dose was D = 2.5 · 1016–1.5 · 1017 ion/cm2. It was found that the thickness of the spattered Ag:Si layer monotonously increased up to 50 nm when D reached its maximum, and the value of the effective sputtering yield was ~1.6.

Improvement of Functional Properties of Medical Stainless Steel Surface by Treatment with Helium, Argon, and Silver Ions

Investigations of the carbon film synthesis on the surface of steel orthopedic structures obtained by ions implantation of argon ions (accelerating voltage Uacc = 40–130 kV and dose range F = (1.25–3.1) × 1016 ion/cm2) in a carbon dioxide medium have been conducted. It is shown that implantation of Ar+ ions in a CO2 environment leads to a significant increase in microhardness of medical steel surface (up to 31 GPa). The method of ion beam modification of the carbon diamond-like film by implantation of silver ions (accelerating voltage 50 kV and dose range 1.2 × 1016–1.8 × 1016 ion/cm2) to impart antimicrobial surface properties has been proposed. The studies in vivo have proved that the steel implants modified by the developed ion beam method efficiently take root in the bone tissue without inflammatory processes in the surrounding biostructures.

Silicon nanostructuring by Ag ions implantation through nanosphere lithography mask

Nanosphere lithography is an effective technique for high throughput fabrication of well-ordered patterns on large areas. This study reports on nanostructuring of silicon samples by means of Ag ions implantation through self-organized polystyrene (PS) masks. The PS nanospheres with a diameter of ∼150 nm were self-assembled in a hexagonal array on top of Si(100) wafers, and then used as a mask for subsequent 60 keV silver ion implantation. Different fluences were applied up to 2 × 1016 ions/cm2 in order to create a distribution of different sizes and densities of buried metal nanoparticles. The surface morphology and the subsurface structures were studied by scanning electron microscopy and cross-sectional transmission electron microscopy, as a function of the mask deformation upon irradiation and the implantation parameters itself. We demonstrate that Ag is implanted into Si only through the mask openings, thus forming a regular array of amorphized regions over the wide area of silicon substrate. These fragments are of similar dimensions of the spheres with widths of about 190 nm and distributed over 60 nm in depth due to the given ion range. At the subsurface region of the implanted fragments, the synthesis of small sized and optically active Ag nanoparticles is clearly observed. The samples show a strong absorption peak in the long-wavelength region from 689 to 745 nm characteristic for surface plasmon resonance excitations, which could be fitted well using the Maxwell-Garnett`s theory.

Formation of Porous Germanium Layers by Silver-Ion Implantation

We propose a method for the formation of porous germanium (P-Ge) layers containing silver nanoparticles by means of high-dose implantation of low-energy Ag+ ions into single-crystalline germanium (c-Ge). This is demonstrated by implantation of 30-keV Ag+ ions into a polished c-Ge plate to a dose of 1.5 × 1017 ion/cm2 at an ion beam-current density of 5 μA/cm2. Examination by high-resolution scanning electron microscopy (SEM), atomic-force microscopy (AFM), X-ray diffraction (XRD), energy-dispersive X-ray (EDX) microanalysis, and reflection high-energy electron diffraction (RHEED) showed that the implantation of silver ions into c-Ge surface led to the formation of a P-Ge layer with spongy structure comprising a network of interwoven nanofibers with an average diameter of ∼10–20 nm Ag nanoparticles on the ends of fibers. It is also established that the formation of pores during Ag+ ion implantation is accompanied by effective sputtering of the Ge surface.

Создание пористых слоев германия имплантацией ионами серебра

AbstractWe propose a method for the formation of porous germanium ( P -Ge) layers containing silver nanoparticles by means of high-dose implantation of low-energy Ag^+ ions into single-crystalline germanium ( c -Ge). This is demonstrated by implantation of 30-keV Ag^+ ions into a polished c -Ge plate to a dose of 1.5 × 10^17 ion/cm^2 at an ion beam-current density of 5 μA/cm^2. Examination by high-resolution scanning electron microscopy (SEM), atomic-force microscopy (AFM), X-ray diffraction (XRD), energy-dispersive X-ray (EDX) microanalysis, and reflection high-energy electron diffraction (RHEED) showed that the implantation of silver ions into c -Ge surface led to the formation of a P -Ge layer with spongy structure comprising a network of interwoven nanofibers with an average diameter of ∼10–20 nm Ag nanoparticles on the ends of fibers. It is also established that the formation of pores during Ag^+ ion implantation is accompanied by effective sputtering of the Ge surface.