Abstract
We report the development of silver (Ag) ion-beam by Electron Cyclotron Resonance (ECR) plasma sputtering and synthesis of Ag nano-dot arrays by implantation of the Ag+ ions on a pre-fabricated silicon nano-template. Ag atoms are mixed with the argon plasma by sputtering a biased silver plate placed inside the ECR chamber. The extracted and mass-separated Ag+ ions are transported to a UHV target chamber for implantation. The variation of the flux of Ag+ ion beam is studied by changing the various parameters, such as applied bias voltage of Ag plate, microwave power, argon gas pressure and specifically, the position of silver plate from the ECR plasma center. It is observed that the sputtering rate of Ag and thereby the final Ag beam current strongly depends on the applied bias and position of the plate. The dependence of microwave power and gas pressure on beam intensity is also investigated and explained in terms of ionization and mean free path of the ionized atoms. Finally, 6 keV Ag+ ions are implanted on pre-patterned nano-pyramidal templates to form an array of Ag nano dots on a large area, by exploiting the geometrical shape of the templates and the directionality of the ion beam.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.