Over its rather long history, focused electron beam induced deposition (FEBID) has mostly been used as an auxiliary process in passivating surfaces in sample preparation for transmission electron microscopy. This has changed over the last one and a half decades. On the one hand, FEBID has been established as the leading technical approach to lithography mask repair on the industrial scale. On the other hand, FEBID-related technical and methodological developments, FEBID-derived materials, and FEBID-based device fabrication have had a significant impact in various areas of basic and applied research, such as nanomagnetism and superconductivity, plasmonics, and sensing. Despite this dynamic development, the FEBID user base does still form a rather exclusive club of enthusiasts. In this Perspective, our aim is to provide sufficient insight into the basics of FEBID, its potential, as well as its challenges, to scientists working in the broader fields of materials science, nanotechnology, and device development. It is our hope to spark growing interest and even excitement into FEBID which, as we believe, still has to live up to its full potential.
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