Thin-film silicon micro resonators are fabricated by surface micromachining at temperatures that are CMOS and large area substrate-compatible. Disk resonators offer large working surfaces and a large number of vibrational modes. The vibrational modes of micromechanical disk resonators made from hydrogenated amorphous silicon thin films were studied in this work. The dynamic behavior of these structures is shown to be mechanically described to be in the transition between a membrane and a plate due to the influence of residual stresses generated during the film growth and to thermal mismatch with underlying layers. Non-degenerate modes are observed as a consequence of the radial symmetry and their effective stiffness is related to the anchor geometry and the parity of the number of diametric nodal lines. The experimentally measured frequencies were compared with the simulated values from finite element modeling with good agreement. Investigation of the intrinsic quality factors shows that there is a dependence of the energy dissipation per cycle with the mode order that is related to the clamping anchors. Thermal annealing experiments show that enhanced quality factors can be obtained using low temperature annealing for a limited period of time.
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