Vegetable soybeam germplasm was screened for its tolerance to 0, 50 and 100 μM Al in solution culture. Plants were inoculated with prescreened acid-Al tolerantBradyrhizobium japonicum strain USDA 110 and a localRhizobium isolate SM867. Aluminum concentrations of 0, 50, and 100 μM affected the root lengths of all germplasm lines in the first few weeks of their growth. At 100 μM, the plants had severely stunted roots throughout the growing period of 35 days, but at 50 μM the initial stunting of the roots was overcome after the third week of growth, and there were no significant differences between the root lengths of these plants and of the controls. The appearance of the first nodule was delayed for 2–3 and 4–5 days at 50 μM and 100 μM Al, respectively. There was a significant reduction in nodule numbers and acetylene reduction activity (ARA) at 100 μM Al. At 50 μM Al, even though the number of nodules was decreased significantly, nodules were larger in size, so there was no significant reduction in nodule fresh weight and ARA. No significant differences in nitrogen fixing abilities of the soybean lines were observed between the twoRhizobium strains. Germplasm line Kahala showed the greatest tolerance to 50 μM Al, and Kahala, Kim and Wolverine tolerated 100 μM Al better than other germplasm lines.